Routing for power signals including a redistribution layer

Abstract

Semiconductor devices and systems include semiconductor devices with first signal traces conveying a first power signal, second signal traces conveying a second power signal, and third signal traces conveying a third power signal. Each of the power signals are connected on a redistribution layer, a first wiring layer, and first-layer contacts. At least one of the first signal traces on the redistribution layer includes a cutout region and the third signal traces include a bypass structure on the redistribution layer and within the cutout region. The bypass structure conveys the third power signal on the redistribution layer around the first-layer contacts coupled to the first signal traces on the redistribution layer.

What is claimed is: 
     
       1. A semiconductor device, comprising:
 a semiconductor substrate including transistor circuitry; 
 a redistribution layer comprising:
 a first polygonal structure for conveying a first power signal and including a first cutout region; 
 a second polygonal structure for conveying a second power signal; and 
 an island polygon for conveying a third power signal and positioned within the first cutout region, wherein the island polygon does not touch the first polygonal structure; 
 
 a first wiring layer comprising one or more first-layer signal traces for conveying the third power signal; and 
 a plurality of first-layer contacts coupling the one or more first-layer signal traces to the island polygon. 
 
     
     
       2. The semiconductor device of  claim 1 , wherein the first polygonal structure and the island polygon include interdigitized fingers for coupling to the first-layer contacts. 
     
     
       3. The semiconductor device of  claim 1 , wherein:
 the second polygonal structure includes a second cutout region; and 
 the island polygon is further positioned within the second cutout region and does not touch the second polygonal structure. 
 
     
     
       4. The semiconductor device of  claim 3 , wherein:
 the first polygonal structure and the island polygon include first interdigitized fingers for coupling to a first set of the first-layer contacts; and 
 the second polygonal structure and the island polygon include second interdigitized fingers for coupling to a second set of the first-layer contacts. 
 
     
     
       5. The semiconductor device of  claim 3 , wherein the island polygon forms a serpentine arrangement through first interdigitized fingers of the first polygonal structure and second interdigitized fingers of the second polygonal structure. 
     
     
       6. The semiconductor device of  claim 1 , wherein:
 the first wiring layer further comprises a plurality of first-layer signal traces for conveying each of the first power signal, the second power signal, and the third power signal; and 
 the semiconductor device further comprises a second wiring layer comprising:
 a plurality of second-level signal traces for conveying each of the first power signal, the second power signal, and the third power signal; and 
 a plurality of second-layer contacts coupling the first-layer signal traces to the second-level signals traces. 
 
 
     
     
       7. The semiconductor device of  claim 1 , wherein:
 the first power signal comprises a higher VDD signal; 
 the second power signal comprises a VSS signal; and 
 the third power signal comprises a lower VDD signal. 
 
     
     
       8. The semiconductor device of  claim 1 , wherein the transistor circuitry includes:
 a first switch circuit configured for passing the first power signal to an operating power signal; and 
 a second switch circuit configured for passing the third power signal to the operating power signal. 
 
     
     
       9. The semiconductor device of  claim 8 , wherein the operating power signal comprises a VDD for buffers driving a data bus and the second power signal comprises a VSS for the buffers driving the data bus. 
     
     
       10. The semiconductor device of  claim 1 , wherein the first cutout region forms a void in the first polygonal structure. 
     
     
       11. The semiconductor device of  claim 1 , wherein the first cutout region forms a modification of the perimeter of the first polygonal structure. 
     
     
       12. A semiconductor device, comprising:
 a semiconductor substrate including transistor circuitry; 
 first signal traces configured for conveying a first power signal on a redistribution layer, a first wiring layer, and first-layer contacts coupled to the first signal traces; 
 second signal traces configured for conveying a second power signal on the redistribution layer, the first wiring layer, and first-layer contacts coupled to the second signal traces; and 
 third signal traces configured for conveying a third power signal on the redistribution layer, the first wiring layer, and first-layer contacts coupled to the third signal traces; 
 wherein:
 at least one of the first signal traces on the redistribution layer includes a cutout region; and 
 the third signal traces include a bypass structure on the redistribution layer and within the cutout region, the bypass structure configured to convey the third power signal on the redistribution layer around the first-layer contacts coupled to the first signal traces on the redistribution layer. 
 
 
     
     
       13. The semiconductor device of  claim 12 , wherein the first signal traces on the redistribution layer and the bypass structure include interdigitized fingers for the first-layer contacts coupled to the first signal traces and the first-layer contacts coupled to the bypass structure. 
     
     
       14. The semiconductor device of  claim 12 , wherein:
 at least one of the second signal traces on the redistribution layer includes a second cutout region; and 
 the bypass structure is further positioned within the second cutout region and is further configured to convey the third power signal on the redistribution layer around the first-layer contacts coupled to the second signal traces on the redistribution layer. 
 
     
     
       15. The semiconductor device of  claim 14 , wherein:
 the first signal traces on the redistribution layer and the bypass structure include first interdigitized fingers for the first-layer contacts coupled to the first signal traces and the first-layer contacts coupled to the bypass structure; and 
 the second signal traces on the redistribution layer and the bypass structure include second interdigitized fingers for the first-layer contacts coupled to the second signal traces and the first-layer contacts coupled to the bypass structure. 
 
     
     
       16. The semiconductor device of  claim 14 , wherein the bypass structure forms a serpentine arrangement through first interdigitized fingers of the first signal traces on the redistribution layer and second interdigitized fingers of the second signal traces on the redistribution layer. 
     
     
       17. The semiconductor device of  claim 12 , wherein the semiconductor device comprises a memory device. 
     
     
       18. A system, comprising:
 one or more processors; and 
 at least one memory device operably coupled to the one or more processors and comprising:
 a redistribution layer comprising:
 a first polygonal structure for conveying a first power signal and including a first cutout region; 
 a second polygonal structure for conveying a second power signal and including a second cutout region; and 
 an island polygon for conveying a third power signal and positioned within the first cutout region and the second cutout region, wherein the island polygon does not touch the first polygonal structure or the second polygonal structure; 
 
 a first wiring layer comprising one or more first-layer signal traces for conveying the third power signal; and 
 a plurality of first-layer contacts coupling the one or more first-layer signal traces to the island polygon. 
 
 
     
     
       19. The system of  claim 18 , wherein:
 the first polygonal structure and the island polygon include first interdigitized fingers for coupling to a first set of the first-layer contacts; and
 the second polygonal structure and the island polygon include second interdigitized fingers for coupling to a second set of the first-layer contacts. 
 
 
     
     
       20. The system of  claim 18 , wherein the island polygon forms a serpentine arrangement through first interdigitized fingers of the first polygonal structure and second interdigitized fingers of the second polygonal structure.