Deposition mask, deposition apparatus using the same, and method of manufacturing display apparatus using the same

Abstract

A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. The force applied extends the first area and does not extend the recess area. The force not applied defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.

What is claimed is: 
     
       1. A method of manufacturing a thin film of display apparatus, the method comprising:
 preparing a mask frame assembly including:
 a stretched deposition mask defined by a deposition mask which is stretched in a length direction thereof, and 
 a frame to which the stretched deposition mask is bonded; and 
 
 depositing a deposition material through the mask frame assembly and onto a substrate to form the thin film, 
 wherein the preparing the mask frame assembly comprises:
 preparing the deposition mask which is stretchable and includes:
 a first area thereof elongated in the length direction to define a clamping portion which is at opposite ends of the deposition mask in the length direction and to which a force is applied to stretch the deposition mask in the length direction thereof; 
 a recess area thereof disposed adjacent to the first area along a width direction crossing the length direction, the recess area elongated in the length direction of the deposition mask to define a recess which is at each of the opposite ends of the deposition mask; and 
 defining a plurality of pattern portions each comprising a plurality of deposition pattern holes through which the deposition material passes, the pattern portions comprising:
 a plurality of first pattern portions arranged in the first area along the length direction, and 
 a plurality of second pattern portions arranged in the recess area along the length direction and spaced apart from the plurality of first patterns along the width direction, 
 
 wherein the deposition mask which is unstretched defines 
 a first distance between adjacent first pattern portions in the length direction which is less than a second distance between adjacent second pattern portions in the length direction; 
 
 stretching the deposition mask in the length direction thereof by applying the force to the clamping portion at the opposite ends of the deposition mask, wherein the stretching of the deposition mask both:
 extends the first area of the deposition mask in the length direction and defines an extended first distance between the adjacent first pattern portions which is greater than the first distance, and 
 does not extend the recess area of the deposition mask in the length direction and maintains the second distance between the adjacent second pattern portions; and 
 
 attaching the stretched deposition mask to the frame to prepare the mask frame assembly. 
 
 
     
     
       2. The method of  claim 1 , wherein each of the pattern portions has a planar shape including one of a square shape, a circular shape, and an oval shape. 
     
     
       3. The method of  claim 2 , wherein each of the pattern portions has the square shape and includes rounded corners. 
     
     
       4. The method of  claim 1 , wherein
 the plurality of first pattern portions defines a plurality of first distances respectively between adjacent first pattern portions and the plurality of second pattern portions defines a plurality of second distances respectively between adjacent second pattern portions, and 
 the first distances and the second distances are respectively constant. 
 
     
     
       5. The method of  claim 1 , wherein
 the plurality of first pattern portions defines a plurality of first distances respectively between adjacent first pattern portions and the plurality of second pattern portions defines a plurality of second distances respectively between adjacent second pattern portions, and 
 the second distances gradually increases from a center portion of the deposition mask towards the opposite ends of the deposition mask. 
 
     
     
       6. The method of  claim 1 , wherein the attaching the stretched deposition mask to the frame comprises removing the clamping portion. 
     
     
       7. The method of  claim 1 , wherein the extended first distance between the adjacent first pattern portions equals the second distance.