US10976663B2ActiveUtilityA1
Photosensitive composition, colored pattern and method for producing same
Est. expirySep 29, 2036(~10.2 yrs left)· nominal 20-yr term from priority
G03F 7/004C08G 59/20G03F 7/038G02B 5/20G03F 7/105G03F 7/0757G03F 7/0755G03F 7/20G03F 7/0045C08G 77/388
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Claims
Abstract
A photosensitive composition contains a polysiloxane compound, a photoacid generator, a coloring agent and a solvent. A content of the coloring agent with respect to a total solid content of the composition is 5% by weight or more. The polysiloxane compound contains a cyclic polysiloxane structure and a cationically polymerizable functional group. The polysiloxane compound may further have an alkali-soluble functional group. A content of the polysiloxane compound with respect to the total solid content of the composition is preferably 20-80% by weight. The photosensitive composition is used, for example, in formation of a colored pattern.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A photosensitive composition, comprising:
a polysiloxane compound;
a photoacid generator;
a coloring agent; and
a solvent,
wherein the polysiloxane compound comprises a cyclic polysiloxane structure and a cationically polymerizable functional group,
the polysiloxane compound comprises an alicyclic epoxy group and a glycidyl group in one molecule as the cationically polymerizable functional group, and
a content of the coloring agent is 5% by weight or more based on a total solid content.
2. The photosensitive composition according to claim 1 , wherein a content of the polysiloxane compound is from 20% to 80% by weight based on the total solid content.
3. The photosensitive composition according to claim 1 , wherein the polysiloxane compound further comprises an alkali-soluble functional group.
4. The photosensitive composition according to claim 3 , wherein the alkali-soluble functional group has the following structure X1 or X2:
5. The photosensitive composition according to claim 4 , wherein the alkali-soluble functional group has the structure of X1.
6. The photosensitive composition according to claim 5 , further comprising:
a reactive diluent having at least two cationically polymerizable functional groups in one molecule.
7. The photosensitive composition according to claim 6 , wherein a content of the reactive diluent is from 10 to 150 parts by weight based on 100 parts by weight of the polysiloxane compound.
8. The photosensitive composition according to claim 6 , wherein a content of the reactive diluent is from 20 to 70 parts by weight with based on 100 parts by weight of the polysiloxane compound.
9. The photosensitive composition according to claim 4 , wherein the alkali-soluble functional group has the structure of X2.
10. The photosensitive composition according to claim 9 , further comprising:
a reactive diluent having at least two canonically polymerizable functional groups in one molecule.
11. The photosensitive composition according to claim 10 , wherein a content of the reactive diluent is from 10 to 15 parts by weight with based on 100 parts by weight of the polysiloxane compound.
12. The photosensitive composition according to claim 10 , wherein a content of the reactive diluent is from 20 to 70 parts by weight with based on 100 parts by weight of the polysiloxane compound.
13. The photosensitive composition according to claim 1 , further comprising:
a reactive diluent comprising at least two cationically polymerizable functional groups in one molecule.
14. The photosensitive composition according to claim 13 , wherein the at least two cationically polymerizable functional groups of the reactive diluent are alicyclic epoxy groups.
15. The photosensitive composition according to claim 13 , wherein a content of the reactive diluent is from 5% to 75% by weight based on the total solid content.
16. A colored pattern, comprising:
a cured product of the photosensitive composition of claim 1 .
17. A method for producing a colored pattern, comprising:
applying the photosensitive composition of claim 1 on a substrate; and
performing patterning by exposure and development.Cited by (0)
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