US11251397B2ActiveUtilityA1
Display panel having display area and component installation area, method of fabricating display panel having display area and component installation area, and display apparatus
Assignee: ORDOS YUANSHENG OPTOELECTRONICS CO LTDPriority: Apr 28, 2018Filed: Nov 1, 2018Granted: Feb 15, 2022
Est. expiryApr 28, 2038(~11.8 yrs left)· nominal 20-yr term from priority
Inventors:Jingjing Chen
H10K 59/874H10K 59/873H10K 50/844H10K 71/20H01L 51/5259H01L 51/5253H01L 51/56H10K 71/231H10K 50/846H10K 71/00
47
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0
Cited by
20
References
12
Claims
Abstract
A method of fabricating a display panel having a display area and a component installation area substantially surrounded by the display area. The method includes forming one or more organic layers on a base substrate in both the display area and the component installation area; removing the one or more organic layers in at least a first region of the component installation area; forming an encapsulating material layer in at least the first region of the component installation area; and curing the encapsulating material layer.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A method of fabricating a display panel having a display area and a component installation area substantially surrounded by the display area, comprising:
forming one or more organic layers on a base substrate in both the display area and the component installation area;
removing the one or more organic layers in at least a first region of the component installation area;
forming an encapsulating material layer in at least the first region of the component installation area; and
curing the encapsulating material layer;
wherein removing the one or more organic layers in at least a first region of the component installation area comprises sintering the one or more organic layers in the first region of the component installation area
wherein the method further comprises:
prior to sintering the one or more organic layers in the first region of the component installation area, forming an absorbent layer for absorbing a decomposed material during sintering in at least the first region, the absorbent layer formed on a side of the one or more organic layers away from the base substrate and formed in at least the first region; and
subsequent to sintering the one or more organic layers in the first region of the component installation area, further comprising removing the absorbent layer.
2. The method of claim 1 , wherein the encapsulating material layer is formed in the first region of the component installation area and in a peripheral area surrounding the display area; and
the encapsulating material layer is cured to form an encapsulating layer encapsulating the display area.
3. The method of claim 1 , wherein curing the encapsulating material layer is performed by laser curing.
4. The method of claim 1 , wherein the component installation area comprises the first region and a second region substantially surrounded by the first region; and
the encapsulating material layer is absent in the second region.
5. The method of claim 1 , wherein sintering the one or more organic layers in the first region of the component installation area is performed by laser sintering.
6. The method of claim 1 , wherein the absorbent layer is formed by mechanically pasting a layer of absorbent material on a side of the one or more organic layers away from the base substrate in an inert atmosphere.
7. The method of claim 1 , wherein removing the absorbent layer comprises:
dislodging the absorbent layer by applying a flow of an insert gas toward one or more lateral sides of the absorbent layer; and
removing dislodged absorbent material of the absorbent layer by applying a vacuum suction on top of the absorbent layer.
8. The method of claim 1 , wherein the absorbent layer comprises calcium oxide.
9. The method of claim 1 , wherein the absorbent layer has a margin greater than 500 μm with respect to the first region.
10. The method of claim 1 , wherein the absorbent layer has a thickness in a range of approximately 300 μm to approximately 500 μm.
11. The method of claim 1 , wherein forming the encapsulating material layer in at least the first region of the component installation area comprises:
forming the encapsulating material layer on an encapsulating substrate; and
assembling the encapsulating substrate with the base substrate from a side of the one or more organic layers away from the base substrate.
12. The method of claim 11 , further comprising forming one or more spacers on a side of the one or more organic layers away from the base substrate.Cited by (0)
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