US11421942B2ActiveUtilityA1

Vapor chamber

93
Assignee: MURATA MANUFACTURING COPriority: Sep 29, 2017Filed: Aug 8, 2019Granted: Aug 23, 2022
Est. expirySep 29, 2037(~11.2 yrs left)· nominal 20-yr term from priority
F28D 15/046F28D 15/0233F28F 21/081F28F 2255/02
93
PatentIndex Score
6
Cited by
37
References
11
Claims

Abstract

A vapor chamber that includes a housing defining an internal space, and a working medium and a wick structure in the internal space of the housing. As viewed in a plan view, the vapor chamber has a first region with a first thickness and a second region with a second thickness, the second thickness being smaller than the first thickness.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. A vapor chamber comprising:
 a housing defining an internal space; 
 a working medium enclosed in the internal space of the housing; and 
 a wick structure in the internal space of the housing, wherein 
 as viewed in a cross-sectional view of the vapor chamber, the vapor chamber has a first region with a first thickness and a second region with a second thickness, the second thickness being smaller than the first thickness, 
 the housing includes a first sheet and a second sheet that oppose each other, 
 the vapor chamber further includes a first pillar and a second pillar in each of the first and second regions, where a height of the first pillar in the second region is less than a height of the first pillar in the first region, and 
 at least one of the first pillars are on a first major surface of the wick structure, and at least one of the second pillars are on a second major surface of the wick structure opposite the first major surface. 
 
     
     
       2. The vapor chamber according to  claim 1 , wherein a difference between the first thickness and the second thickness is 10 μm to 500 μm. 
     
     
       3. The vapor chamber according to  claim 1 , wherein a ratio of the second thickness to the first thickness is 0.10 to 0.95. 
     
     
       4. The vapor chamber according to  claim 1 , wherein at least one of the first pillar, the second pillar, and the wick structure is configured differently in the first region and the second region. 
     
     
       5. The vapor chamber according to  claim 1 , wherein the wick structure is disposed only in the first region. 
     
     
       6. The vapor chamber according to  claim 1 , wherein a first wall thickness of the housing in the second region is smaller than a second wall thickness of the housing in the first region. 
     
     
       7. The vapor chamber according to  claim 1 , wherein the housing has a rectangular shape as viewed in the plan view. 
     
     
       8. The vapor chamber according to  claim 1 , wherein the first sheet and the second sheet are in contact with each other at least in a first portion of the second region, and the first sheet and the second sheet oppose each other and define micro gaps interposed therebetween in a second portion of the second region. 
     
     
       9. The vapor chamber according to  claim 8 , wherein the micro gaps are sized such that the working medium in a liquid phase thereof can be transported due to capillary forces through the micro gaps. 
     
     
       10. A heat radiation device comprising the vapor chamber according to  claim 1 . 
     
     
       11. An electronic device comprising the vapor chamber according to  claim 1 .

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