Optical element having metallic seed layer and aluminum layer, and method for producing same

Abstract

A method for producing an aluminum layer is provided. The method includes depositing a metallic seed layer on a substrate, the seed layer having a thickness of not more than 5 nm, and also includes applying the aluminum layer to the seed layer, wherein the aluminum layer has a thickness of more than 30 nm. Further, an optical element, which can be a mirror layer, is provided including the metallic seed layer and the aluminum layer.

The invention claimed is: 
     
       1. A method for producing an optical element including a substrate, a metallic seed layer on the substrate and an aluminum layer deposited on a side of the metallic seed layer that faces away from the substrate, wherein the aluminum layer directly adjoins the metallic seed layer and the aluminum layer has a root mean square roughness of less than 0.7 nm, the method comprising:
 depositing the metallic seed layer on the substrate, the metallic seed layer having a thickness of not more than 5 nm; and 
 applying the aluminum layer directly to the metallic seed layer, wherein the aluminum layer has a thickness of 30 nm to 100 nm inclusive. 
 
     
     
       2. The method according to  claim 1 , wherein the metallic seed layer comprises Cu, Ti, Fe, Zn or Cr. 
     
     
       3. The method according to  claim 1 , wherein the metallic seed layer is between 2 nm and 5 nm thick. 
     
     
       4. The method according to  claim 1 , wherein the metallic seed layer is between 2.5 nm and 3.5 nm thick. 
     
     
       5. The method according to  claim 1 , wherein the aluminum layer has a root mean square surface roughness of less than 0.4 nm. 
     
     
       6. The method according to  claim 1 , further comprising applying a protective layer to the aluminum layer, wherein the protective layer has a thickness of not more than 5 nm. 
     
     
       7. An optical element comprising:
 a substrate; 
 a metallic seed layer on the substrate, the metallic seed layer having a thickness of not more than 5 nm; and 
 an aluminum layer disposed on a side of the metallic seed layer that faces away from the substrate, 
 wherein the aluminum layer directly adjoins the metallic seed layer, 
 wherein the aluminum layer has a thickness of 30 nm to 100 nm inclusive, and 
 wherein the aluminum layer has a root mean square roughness of less than 0.7 nm. 
 
     
     
       8. The optical element according to  claim 7 , wherein the metallic seed layer comprises Cu, Ti, Fe, Zn or Cr. 
     
     
       9. The optical element according to  claim 7 , wherein the optical element is a mirror, and wherein the aluminum layer is a mirror layer. 
     
     
       10. The optical element according to  claim 7 , wherein the metallic seed layer is between 2 nm and 5 nm thick. 
     
     
       11. The optical element according to  claim 7 , wherein the metallic seed layer is between 2.5 nm and 3.5 nm thick. 
     
     
       12. The optical element according to  claim 7 , wherein the aluminum layer has a root mean square surface roughness of less than 0.4 nm. 
     
     
       13. The optical element according to  claim 7 , further comprising a protective layer disposed on the aluminum layer, wherein the protective layer has a thickness of not more than 5 nm. 
     
     
       14. An optical element comprising:
 a substrate; 
 a metallic seed layer on the substrate, the metallic seed layer having a thickness of not more than 5 nm; and 
 an aluminum layer disposed on a side of the metallic seed layer that faces away from the substrate, 
 wherein the aluminum layer directly adjoins the metallic seed layer, 
 wherein the aluminum layer has a thickness of more than 30 nm, 
 wherein the metallic seed layer is between 2.5 nm and 3.5 nm thick, and 
 wherein all layers of the optical element are arranged on a same side of the substrate. 
 
     
     
       15. The optical element of  claim 14 , wherein the metallic seed layer comprises Cu, Ti, Fe, Zn or Cr. 
     
     
       16. The optical element of  claim 14 , wherein the optical element is a mirror, and wherein the aluminum layer is a mirror layer. 
     
     
       17. The optical element of  claim 14 , further comprising a protective layer disposed on the aluminum layer, wherein the protective layer has a thickness of not more than 5 nm. 
     
     
       18. The optical element of  claim 14 , wherein the aluminum layer has a root mean square surface roughness of less than 0.4 nm.