Droplet deposition apparatus

Abstract

A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.

The invention claimed is: 
     
       1. A droplet deposition apparatus comprising:
 a standing wave generator including at least one ultrasonic wave oscillator to emit an ultrasonic wave into a predetermined space; 
 a droplet supplier to supply a droplet; 
 a workpiece retainer to retain a workpiece in the predetermined space; and 
 a controller configured or programmed to execute processes (A) to (C): 
 (A) causing the standing wave generator to generate a standing wave in the predetermined space; 
 (B) causing the droplet supplier to supply a droplet to a node of the standing wave generated in the space; and 
 (C) bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece. 
 
     
     
       2. The droplet deposition apparatus according to  claim 1 , wherein:
 the standing wave generator is capable of changing the standing wave generated in the space; and 
 the process (C) includes depositing the droplet onto the workpiece by changing the standing wave generated in the space. 
 
     
     
       3. The droplet deposition apparatus according to  claim 1 , wherein:
 the standing wave generator includes an actuator to actuate the at least one ultrasonic wave oscillator; and 
 the process (C) includes depositing the droplet onto the workpiece by actuating the at least one ultrasonic wave oscillator. 
 
     
     
       4. The droplet deposition apparatus according to  claim 1 , wherein:
 the workpiece retainer includes a conveyor to transfer the workpiece; and 
 the process (C) includes depositing the droplet onto the workpiece by transferring the workpiece using the conveyor. 
 
     
     
       5. The droplet deposition apparatus according to  claim 1 , wherein the workpiece retainer includes a wire rod including an attachment portion including a distal end to which the workpiece is attached. 
     
     
       6. The droplet deposition apparatus according to  claim 1 , wherein the droplet supplier includes a syringe and a needle to eject a liquid from the syringe. 
     
     
       7. The droplet deposition apparatus according to  claim 1 , wherein:
 the workpiece is a dental prosthesis; and 
 the droplets include a coloring agent for dental prostheses. 
 
     
     
       8. A program for a droplet deposition apparatus comprising:
 a standing wave generator including at least one ultrasonic wave oscillator to emit an ultrasonic wave into a predetermined space; 
 a droplet supplier to supply a droplet; 
 a workpiece retainer to retain a workpiece in the predetermined space; and 
 a controller configured or programmed to execute processes (A) to (C): 
 (A) causing the standing wave generator to form a standing wave in the predetermined space; 
 (B) causing the droplet supplier to supply a droplet to a node of the standing wave formed in the space; and 
 (C) bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece. 
 
     
     
       9. A droplet deposition method comprising:
 (A) forming a standing wave in a predetermined space; 
 (B) supplying a droplet to a node of the standing wave formed in the space; and 
 (C) bringing close to each other a predetermined position of a workpiece retained in the space and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.