OLED display panel and manufacturing method thereof

Abstract

The present invention provides an organic light-emitting diode (OLED) display panel including a substrate, a thin-film transistor, an insulating layer, an auxiliary electrode, an organic light-emitting layer, a shielding stage, and a common electrode. The common electrode is electrically connected to the auxiliary electrode. The shielding stage includes at least one organic material layer. An angle between the shielding stage and the substrate is a threshold value.

What is claimed is: 
     
       1. An organic light-emitting diode (OLED) display panel, comprising:
 a substrate; 
 a thin-film transistor disposed on the substrate; 
 an insulating layer disposed on the thin-film transistor; 
 an auxiliary electrode disposed on the insulating layer; 
 a pixel electrode disposed on the insulating layer and electrically connected to the thin-film transistor; 
 an organic light-emitting layer disposed on the pixel electrode; 
 a shielding stage disposed on the insulating layer, and a projection of the shielding stage on the substrate partially overlapping a projection of the auxiliary electrode on the substrate; and 
 a common electrode disposed on the organic light-emitting layer and electrically connected to the auxiliary electrode, wherein the common electrode surrounds at least two lateral sides of the auxiliary electrode; 
 wherein the shielding stage comprises at least one inorganic material layer, and an angle between the shielding stage and the substrate is a threshold value. 
 
     
     
       2. The OLED display panel as claimed in  claim 1 , wherein a cross-sectional shape of the shielding stage is an inverted trapezoid. 
     
     
       3. The OLED display panel as claimed in  claim 1 , wherein an area of an overlapping portion of the projection of the shielding stage on the substrate and the projection of the auxiliary electrode on the substrate accounts for over 50% of a total area of the projection of the auxiliary electrode on the substrate. 
     
     
       4. The OLED display panel as claimed in  claim 1 , wherein the threshold value ranges from 30 to 45 degrees. 
     
     
       5. The OLED display panel as claimed in  claim 1 , wherein the shielding stage comprises at least one metal layer and at least one organic material layer disposed on the at least one metal layer. 
     
     
       6. The OLED display panel as claimed in  claim 1 , wherein the shielding stage comprises at least two metal layers and at least two oxide layers. 
     
     
       7. The OLED display panel as claimed in  claim 6 , wherein the at least two metal layers are laminated, and the at least two oxide layers are laminated. 
     
     
       8. The OLED display panel as claimed in  claim 1 , wherein the OLED display panel further comprises a pixel electrode layer, and the pixel electrode layer is patterned to form the pixel electrode and a shielding substrate of the shielding stage. 
     
     
       9. A manufacturing method of the OLED display panel as claimed in  claim 1 , comprising the steps of:
 providing a substrate and forming a circuit functional layer on the substrate; 
 forming an auxiliary electrode on the circuit functional layer; 
 forming a shielding stage on the circuit functional layer, wherein a projection of the shielding stage on the substrate partially overlaps a projection of the auxiliary electrode on the substrate, the shielding stage comprises at least one inorganic material layer, and an angle between the shielding stage and the substrate is a threshold value; and 
 forming a common electrode on the circuit functional layer and controlling an evaporation angle to electrically connect the common electrode and the auxiliary electrode. 
 
     
     
       10. The manufacturing method of the OLED display panel as claimed in  claim 9 , wherein a cross-sectional shape of the shielding stage is an inverted trapezoid. 
     
     
       11. The manufacturing method of the OLED display panel as claimed in  claim 9 , wherein an area of an overlapping portion of the projection of the shielding stage on the substrate and the projection of the auxiliary electrode on the substrate accounts for over 50% of a total area of the projection of the auxiliary electrode on the substrate. 
     
     
       12. The manufacturing method of the OLED display panel as claimed in  claim 9 , wherein the threshold value ranges from 30 to 45 degrees. 
     
     
       13. The manufacturing method of the OLED display panel as claimed in  claim 9 , wherein the shielding stage comprises at least one metal layer and at least one organic material layer disposed on the at least one metal layer. 
     
     
       14. The manufacturing method of the OLED display panel as claimed in  claim 9 , wherein the shielding stage comprises at least two metal layers and at least two oxide layers.