X-ray device having multiple beam paths

Abstract

An X-ray beam generating system including an X-ray source for generating an original primary X-ray beam, an optics system including a first optics component and at least one second optics component which are movable relative to the X-ray source in order either to bring the first optics component into interaction with the original primary X-ray beam, whereupon a first primary X-ray beam is generated which is deflected at a first deflection angle, or to bring the second optics component into interaction with the original primary X-ray beam, whereupon a second primary X-ray beam is generated which is deflected at a second deflection angle, and a rotating device to rotate the X-ray beam generating system through either a first rotation angle or a second rotation angle to allow either the first primary X-ray beam or the second primary X-ray beam to impinge on a sample region.

The invention claimed is: 
     
       1. A device for X-ray examination of a sample, the device comprising:
 an X-ray beam generating system, comprising:
 an X-ray source for generating an original primary X-ray beam; 
 an optics system comprising a first optics component and at least one second optics component which are movable relative to the X-ray source in order either to bring the first optics component into interaction with the original primary X-ray beam, whereupon a first primary X-ray beam is generated which is deflected at a first deflection angle, or 
 
 to bring the second optics component into interaction with the original primary X-ray beam, whereupon a second primary X-ray beam is generated which is deflected at a second deflection angle; and 
 a rotating device having a rotating stage on which the X-ray beam generating system is mounted in order to rotate the X-ray beam generating system through either a first rotation angle or a second rotation angle about a rotating stage axis in order to allow either the first primary X-ray beam or the second primary X-ray beam to impinge on a sample region. 
 
     
     
       2. The device according to  claim 1 , wherein the rotating stage axis is parallel to a goniometer axis, and wherein the sample region is located at the goniometer axis. 
     
     
       3. The device according to  claim 1 , wherein the rotating stage axis is arranged offset from the goniometer axis. 
     
     
       4. The device according to  claim 1 , wherein a distance between the X-ray source and the rotating stage axis is between 0.5 and 0.9 times a distance between the goniometer axis and the X-ray source. 
     
     
       5. The device according to  claim 1 , wherein a deflection axis about which the first primary X-ray beam or the second primary X-ray beam is deflected relative to the original primary X-ray beam by the first deflection angle and the second deflection angle, respectively, is parallel to the rotating stage axis. 
     
     
       6. The device according to  claim 1 , further comprising:
 an X-ray detector; 
 a goniometer having a first arm and a second arm, the first arm and/or the second arm being pivotable about the goniometer axis, the first arm having mounted thereon the rotating stage having the X-ray beam generating system, and the second arm having mounted thereon the X-ray detector. 
 
     
     
       7. The device according to  claim 1 , wherein at least one of the optics components is configured to generate from the original primary X-ray beam a monochromatic or polychromatic primary X-ray beam that is parallel or divergent or focusing collimating. 
     
     
       8. The device according to  claim 1 , wherein at least one of the optics components comprises one or more of the following components:
 a collimating X-ray mirror, 
 a focusing X-ray mirror, 
 a multilayer X-ray mirror, 
 a multilayer monochromator, 
 a single crystal optics, 
 a 1D mirror, 
 a 2D mirror. 
 
     
     
       9. The device according to  claim 1 , wherein the optics components are linearly movable relative to the X-ray source substantially perpendicular to the original primary X-ray beam. 
     
     
       10. The device according to  claim 1 , wherein the optics system comprises a carriage mounted on the rotating stage and displaceable relative to the X-ray source, on which carriage the optics components are mounted. 
     
     
       11. The device according to  claim 1 , wherein the first optics component and the second optics component are selectively movable such that the original primary X-ray beam exits the X-ray source and impinges on the first optics component and the second optics component, respectively, in each case at the same optimal or desired angular range relative to an electron target region on the anode of the X-ray source. 
     
     
       12. The device according to  claim 1 , wherein at least one of the optics components is rotatable about an optics rotation axis parallel to the rotating stage axis. 
     
     
       13. The device according to  claim 1 , wherein the original primary X-ray beam is not deflected after exiting the X-ray source and before entering the optics system. 
     
     
       14. The device according to  claim 1 , further comprising:
 an aperture diaphragm, substantially perpendicular to the first and/or second primary X-ray beam, variable with respect to aperture position and/or aperture size, being mounted downstream of the optics system on the rotating stage. 
 
     
     
       15. The device according to  claim 1 , wherein the original primary X-ray beam is generated by bombarding a single electron target region on an anode of the X-ray source in order to generate both the first primary X-ray beam and the second primary X-ray beam from the original primary X-ray beam when the first optics component and the second optics component, respectively, is struck by the original primary X-ray beam. 
     
     
       16. The device according to  claim 1 , wherein the X-ray source, the X-ray detector and the sample region are arranged substantially in Bragg-Brentano geometry. 
     
     
       17. The device according to  claim 1 , further comprising:
 a controller configured to adjust a rotation angle of the rotating stage depending on a traveling distance of the optics components. 
 
     
     
       18. The device according to  claim 1 , further comprising:
 a sample holder configured to hold the sample in the sample region. 
 
     
     
       19. A method of X-ray examination of a sample, the method comprising:
 generating an original primary X-ray beam by means of an X-ray source of an X-ray beam generating system further comprising an optics system having a first optics component and at least one second optics component which are movable relative to the X-ray source; 
 bringing the first optics component of the optics system into interaction with the original primary x-ray beam to generate a first primary x-ray beam deflected at a first deflection angle, wherein a rotating device includes a rotating stage on which the x-ray beam generating system is mounted and which is adjusted at a first rotation angle to allow the first primary x-ray beam to impinge on a sample region; 
 further comprising:
 moving the first optics component and the second optics component of the optics system relative to the X-ray source to bring the second optics component into interaction with the original primary X-ray beam to generate a second primary X-ray beam deflected at a second deflection angle; and 
 rotating the rotating stage to a second rotation angle about a rotating stage axis to allow the second primary x-ray beam to impinge on the sample region.