US12208000B2ActiveUtilityA1
Corner-lock stitch patterns
Est. expiryJun 30, 2035(~9 yrs left)· nominal 20-yr term from priority
D05B 93/00A61F 2002/0068A61F 2220/0075D05B 1/12A61F 2/0063
97
PatentIndex Score
1
Cited by
178
References
20
Claims
Abstract
Corner-lock stitch patterns. A mesh pattern may include a first pattern of a first upper thread and a first lower thread comprising one or more first polygonal or circular rings, and a second pattern of a second upper thread and a second lower thread comprising one or more second polygonal or circular rings. At least one of the second polygonal or circular rings may overlap with at least one of the first polygonal or circular rings at an area of overlap. The area of overlap may include a corner-lock stitch pattern in which the second upper thread and second lower thread envelop the first upper thread and the first lower thread.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A mesh pattern, comprising:
a first pattern of a first upper thread and a first lower thread comprising one or more first polygonal or circular rings; and
a second pattern of a second upper thread and a second lower thread comprising one or more second polygonal or circular rings, wherein at least one of the second polygonal or circular rings overlaps at least one of the first polygonal or circular rings at an area of overlap, and wherein the area of overlap comprises a corner-lock stitch pattern in which the second upper thread and second lower thread envelop the first upper thread and the first lower thread.
2. The mesh pattern of claim 1 , wherein the corner-lock stitch pattern includes one or more thread interlace points and two or more thread overlays, each thread overlay comprising the second upper thread and the second lower thread enveloping the first upper thread and the first lower thread.
3. The mesh pattern of claim 1 , wherein each of the first and second patterns includes a zigzag pattern.
4. The mesh pattern of claim 1 , wherein the first upper and lower threads and the second upper and lower threads comprise a biocompatible material.
5. The mesh pattern of claim 4 , wherein the biocompatible material is resorbable.
6. The mesh pattern of claim 1 , wherein at least the first upper and lower threads are a same continuous thread.
7. The mesh pattern of claim 1 , wherein at least the second upper and lower threads are a same continuous thread.
8. The mesh pattern of claim 1 , wherein one or more of the first upper thread, the first lower thread, the second upper thread, and the second lower thread comprises a chain stitch pattern.
9. The mesh pattern of claim 1 , wherein one or more of the first upper thread, the first lower thread, the second upper thread, and the second lower thread comprises a monofilament yarn or a multifilament yarn.
10. The mesh pattern of claim 1 , wherein the one or more first polygonal or circular rings and/or the one or more second polygonal or circular rings comprise a triangular, a diamond, a square, a rhomboid, a rectangular, or a parallelogram shape.
11. The mesh pattern of claim 1 , wherein the one or more first polygonal or circular rings and/or the one or more second polygonal or circular rings comprise an irregular shape.
12. A mesh implant, comprising:
a substrate having a mesh formed therein, the mesh comprising:
a first pattern of a first upper thread and a first lower thread comprising one or more first polygonal or circular rings; and
a second pattern of a second upper thread and a second lower thread comprising one or more second polygonal or circular rings, wherein at least one of the second polygonal or circular rings overlaps at least one of the first polygonal or circular rings at an area of overlap, and wherein the area of overlap comprises a corner-lock stitch pattern in which the second upper thread and second lower thread envelop the first upper thread and the first lower thread.
13. The mesh implant of claim 12 , wherein the substrate comprises a plurality of layers.
14. The mesh implant of claim 12 , wherein the corner-lock stitch pattern defines pores having a length, width, or diameter ranging from 0.1 mm to 10 mm.
15. The mesh implant of claim 12 , wherein the first upper and lower threads and the second upper and lower threads comprise a biocompatible material.
16. The mesh implant of claim 15 , wherein the biocompatible material is resorbable.
17. A biotextile having a reinforcing mesh sewn therein, the reinforcing mesh comprising:
a first pattern of a first upper thread and a first lower thread comprising one or more first polygonal or circular rings; and
a second pattern of a second upper thread and a second lower thread comprising one or more second polygonal or circular rings, wherein at least one of the second polygonal or circular rings overlaps at least one of the first polygonal or circular rings at an area of overlap, and wherein the area of overlap comprises a corner-lock stitch pattern in which the second upper thread and second lower thread envelop the first upper thread and the first lower thread.
18. The biotextile of claim 17 , wherein the corner-lock stitch pattern includes one or more thread interlace points and two or more thread overlays, each thread overlay comprising the second upper thread and the second lower thread enveloping the first upper thread and the first lower thread.
19. The biotextile of claim 17 , wherein the biotextile comprises a polymer mesh, wherein the polymer mesh comprises a polymer selected from the group consisting of polydioxanone, polycarbonate, polyurethane, poly(alpha-ester), polyglycolide, poly(L-lactic acid), poly(D-lactic acid), poly(D,L-lactic acid), poly(4-hydroxybutyric acid), polycaprolactone, polyethylene, polypropylene, polyester, poly(propylene fumarate), polyanhhydride, polyacetal, polycarbonate, poly(ortho ester), polyphosphazene, polyphosphoester, polytetrafluoroethylene, and polyethylene terephthalate.
20. The biotextile of claim 17 , wherein the biotextile comprises an extracellular matrix.Cited by (0)
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