Metal material for storage container of high-purity hydrogen fluoride with improved scratch resistance and method for manufacturing same

Abstract

The present disclosure relates to a metal material for a container for storing high-purity hydrogen fluoride, and to a manufacturing method therefor. Specifically, the disclosure relates to a metal material for a container for storing high-purity hydrogen fluoride, and a manufacturing method therefor. The metal material includes a graphite layer on the surface of a metal substance, and nickel fluoride films formed in structural defect spaces within the graphite layer, so that corrosion resistance and scratch resistance are improved, and thus high-purity hydrogen fluoride, which is a corrosive gas, can be stored and transferred without being contaminated.

The invention claimed is: 
     
       1. A method of manufacturing a metal material for a storage container for high-purity hydrogen fluoride, the method comprising:
 (1) forming a nickel plating layer on a metal substrate; 
 (2) forming a graphite layer on the surface of the nickel plating layer; 
 (3) plating an upper portion of the graphite layer with nickel to form a nickel film so that the nickel is inserted into structural defect spaces in the graphite layer, and then removing the nickel film formed on the upper portion of the graphite layer; and 
 (4) forming a graphite layer containing nickel fluoride by fluorinating the nickel inserted into the structural defect space in the graphite layer after the step (3) is completed. 
 
     
     
       2. The method of  claim 1 , wherein the graphite layer has a thickness in a range of 2 to 100 μm. 
     
     
       3. The method of  claim 1 , wherein the graphite layer in the step (2) is formed by reacting a carbon source reaction gas with the surface of the nickel plating layer. 
     
     
       4. The method of  claim 1 , wherein the fluorinating of the step (4) is performed using at least one gas selected from the group consisting of fluorine (F 2 ), hydrogen fluoride (HF), chlorine trifluoride (ClF 3 ), nitrogen fluoride (NF 3 ), and methane fluoride (CH 3 F), or a gas obtained by diluting the selected gas with an inert gas.