Photoresist stripper composition for manufacturing display

Abstract

The present invention relates to a photoresist stripper composition for manufacturing a display, and more particularly, to an integrated photoresist stripper composition which can be used in every process for manufacturing a display. More specifically, the photoresist stripper composition for manufacturing a display according to the present invention can be applied to all of transition metals and oxide semiconductor wirings, and has an excellent ability to remove modified photoresist after a hard bake process, and implant process, and a dry etch process have been performed. In particular, the photoresist stripper composition for manufacturing a display according to the present invention exhibits a corrosion inhibitory effect that has been further specialized for copper (Cu) wiring pattern edge portions which are susceptible to corrosion following dry-etching.

The invention claimed is: 
     
       1. A photoresist stripper composition for manufacturing a display, comprising:
 (a) 0.01 to 3 wt % of a transition metal and a metal oxide corrosion inhibitor; 
 (b) 0.05 to 3 wt % of a non-sulfur-based corrosion inhibitor; 
 (c) 1 to 10 wt % of a mixture of a primary amine and a secondary amine; 
 (d) 1 to 15 wt % of a cyclic alcohol; 
 (e) 1 to 30 wt % of an aprotic polar organic solvent; 
 (f) 1 to 30 wt % of a protic polar organic solvent; and 
 (g) deionized water as the remainder, 
 wherein the transition metal and a metal oxide corrosion inhibitor is one or more selected from the group consisting of monoammonium phosphate, diammonium phosphate, triammonium phosphate, methylphosphonic acid, ethylphosphonic acid, propylphosphonic acid, butylphosphonic acid, tert-butyl phosphonic acid, pentyphosphonic acid, n-hexylphosphonic acid, triethyl phosphate, octylphosphonic acid, decylphosphonic acid, dodecylphosphonic acid, tetradecylphosphonic acid, octadecylphosphonic acid, hexylphosphate, heptylphosphate, octylphosphate, nonylphosphate, decylphosphate, and dodecylphosphate, 
 wherein the non-sulfur-based corrosion inhibitor is any one or more selected from the group consisting of imidazo[4,5-b]pyridine, 6-methylimidazo[4,5-b]pyridine, imidazo[4,5-b]pyridine-2-carboxylic acid, 6-methylimidazo[4,5-b]pyridine-2-carboxylic acid, 1H-pyrazolo[3,4-b]pyridine, 3-methyl-1H-pyrazolo[3,4-b]pyridine, 1H-pyrazolo[3,4-b]pyridine-3-carboxylic acid, and 5-methyl-1H-pyrazolo[3,4-b]pyridine-3-carboxylic acid, and 
 wherein the content of the primary amine in the mixture of the primary amine and the secondary amine is less than 3 wt % based on the total weight of the composition. 
 
     
     
       2. The composition of  claim 1 , wherein the primary amine is selected from the group consisting of monoethanol amine, monoisopropanol amine, 2-amino-2-methyl-1-propanol, aminoethoxyethanol, and a mixture thereof. 
     
     
       3. The composition of  claim 1 , wherein the secondary amine is selected from the group consisting of 2-acetyl ethanol amine, diethanol amine, 2-methylaminoethanol, 2-isopropylaminoethanol, and a mixture thereof. 
     
     
       4. The composition of  claim 1 , wherein the cyclic alcohol is selected from the group consisting of tetrahydrofurfuryl alcohol, furfuryl alcohol, isopropylidene glycerol, and a mixture thereof. 
     
     
       5. The composition of  claim 1 , wherein the aprotic polar organic solvent is selected from the group consisting of dimethyl propionamide, sulfolane, ethylformamide, 1,3-dimethyl-2-imidazolidinone, 2-pyrrolidone, 1-formylpiperidine, and a mixture thereof. 
     
     
       6. The composition of  claim 1 , wherein the protic polar organic solvent is any one or more selected from the group consisting of ethylene glycol, propylene glycol, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether (BDG), diethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monobutyl ether, triethylene glycol monopropyl ether, triethylene glycol monobutyl ether, triethylene glycol monomethyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monopropyl ether, and tripropylene glycol monobutyl ether.