Mask orbiting for laser ablated feature formation

Abstract

This invention concerns a process useful for ablating features from a substrate, including the steps of illuminating the substrate with laser light that has passed through a mask to form an ablated feature in the substrate, wherein the mask is orbited perpendicular to the angle of the laser light during formation of the feature thereby forming a selected wall shape. This invention also concerns an apparatus useful for making holes in a substrate having a radiation source; a mask positioned between the radiation source and a substrate to be irradiated with radiation from the radiation source, wherein the mask is capable of following a trajectory perpendicular to the angle of the radiation.

What is claimed is:  
     
         1 . A method for ablating features in a substrate, comprising: irradiating the substrate with radiation that has passed through a mask to form an ablated feature in the substrate, wherein the mask follows a predetermined trajectory perpendicular to the optical axis during formation of the ablated feature, thereby forming a selected wall shape.  
     
     
         2 . The process of    claim 1    wherein the mask is moved by a piezoelectric positioner that is attached to the mask.  
     
     
         3 . The process of    claim 1    wherein the radiation is laser light.  
     
     
         4 . The process of    claim 1    wherein the substrate is a polymer film.  
     
     
         5 . The process of    claim 1    wherein the feature is an inkjet nozzle in a polyimide film.  
     
     
         6 . The process of    claim 1    wherein the selected wall shape is substantially convex.  
     
     
         7 . The process of    claim 1    wherein the selected wall shape is substantially concave.  
     
     
         8 . The process of    claim 1    wherein the selected wall shape is substantially straight.  
     
     
         9 . A process useful for ablating features from a polymer film, comprising: illuminating polymer film with laser light from an excimer laser that has passed through a patterned metallic and/or dielectric mask on a fused silica or quartz substrate to form an ablated feature in the polymer film, wherein the mask is moved in a plane perpendicular to the optical system axis during formation of the feature, thereby forming a selected wall shape, and wherein the feature has an exit diameter in the range less than about 30 microns.  
     
     
         10 . An apparatus useful for making holes in a substrate, comprising: a radiation source; a mask positioned between the radiation source and a substrate to be irradiated with radiation from the radiation source, wherein the mask is capable of moving in a plane perpendicular to the optical system axis when the substrate is being irradiated such that a different ablated feature shape is formed than would have been formed if the mask were not orbited.  
     
     
         11 . The apparatus of    claim 10    wherein the radiation source is an excimer laser.  
     
     
         12 . The apparatus of    claim 10    wherein the mask is moved by a piezoelectric positioner that is attached to the mask.  
     
     
         13 . The apparatus of claim BB wherein the mask is moved by a voice coil positioner that is attached to the mask.  
     
     
         14 . The apparatus of    claim 10    wherein the substrate is a polymer film.  
     
     
         15 . The apparatus of    claim 10    wherein the mask is comprised of a fused quartz base and at least one area of a dielectric layer that at least partially reduces radiation transmission through the mask.  
     
     
         16 . The apparatus of    claim 10    further comprising a projection lens between the mask and the substrate.  
     
     
         17 . An ink jet print head comprising: 
 a substrate having a generally planar surface;    a nozzle array having at least two nozzles extending through the substrate, each of said at least two nozzles having a longitudinal axis;    wherein the longitudinal axis of at least one of said at least two nozzles of the nozzle array is non-orthogonal with the surface of the substrate.    
     
     
         18 . The print head of    claim 17   , wherein the longitudinal axis of said at least two nozzles of the nozzle array are not parallel to each other.  
     
     
         19 . The print head of    claim 17   , wherein the longitudinal axis of each nozzle of the nozzle array is angled toward a common predetermined point.  
     
     
         20 . The print head of    claim 19   , wherein the print head further comprises a plurality of nozzle arrays.  
     
     
         21 . The print head of    claim 20   , wherein each of said plurality of nozzle arrays has a first nozzle whose longitudinal axis is in parallel alignment with a first common predetermined longitudinal axis.  
     
     
         22 . The print head of    claim 21   , wherein each of said plurality of nozzle arrays has a second nozzle whose longitudinal axis is in parallel alignment with a second common predetermined longitudinal axis.