High density cobalt-manganese coprecipitated nickel hydroxide and process for its production

Abstract

The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.

What is claimed is:  
     
         1 . High density cobalt-manganese coprecipitated nickel hydroxide with a tapping density of 1.5 g/cc or greater.  
     
     
         2 . High density cobalt-manganese coprecipitated nickel hydroxide according to  claim 1 , characterized in that, where said cobalt-manganese coprecipitated nickel hydroxide is represented as (Ni (1-x-y) Co x Mn y )(OH) 2 , 1/10≦x≦1/3 and 1/20≦y≦1/3.  
     
     
         3 . A process for production of high density cobalt-manganese coprecipitated nickel hydroxide of  claim 1 , characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.  
     
     
         4 . The process of  claim 3  wherein said reducing agent is hydrazine.