Co-base target and method of producing the same

Abstract

The invention relates to a Co-base target made of a sintered powder, having a restrained amount of oxygen, and a producing method thereof. The target contains from more than 10 to not more than 25 at % of B and not more than 100 ppm of oxygen. It may contain 30≧Pt≧5 at%, 30≧Cr≧10 at%, 10≧Ta>0 at% and/or 30≧Ni>0 at%. It may contain also from more than 0 (zero) to not more than 15 at% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and rare earth elements. The target is produced by melting a Co-base alloy together with an additive B in an amount of from more than 10 to not more than 25 at% whereby deoxidizing, rapidly cooling the molten metal to produce an alloy powder and sintering the alloy powder. It can be optionally produced by mixing the above alloy powder with another metal powder, more particularly consisting of one or more elements selected from the group consisting of Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and Pt, and sintering the powder mixture.

What is claimed is:  
     
         1 . A Co-base target produced by powder sintering, which comprises from more than 10 atomic % to 25 atomic % of B (boron) and not more than 100 ppm of oxygen as an impurity.  
     
     
         2 . A Co-base target according to  claim 1 , which further comprises from more than zero to 10 atomic % Ta.  
     
     
         3 . A Co-base target according to  claim 1 , which further comprises from more than zero to 30 atomic % Ni.  
     
     
         4 . A Co-base target according to  claim 1 , which further comprises from more than zero to 10 atomic % Ta and from more than zero to 30 atomic % Ni.  
     
     
         5 . A Co-base target according to  claim 1 , which further comprises from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM.  
     
     
         6 . A Co-base target according to  claim 5 , which further comprises from more than zero to 10 atomic % Ta.  
     
     
         7 . A Co-base target according to  claim 5 , which further comprises from more than zero to 30 atomic % Ni.  
     
     
         8 . A Co-base target according to  claim 5 , which further comprises from more than zero to 10 atomic % Ta and from more than zero to 30 atomic % Ni.  
     
     
         9 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         10 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         11 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 30 atomic % Ni, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         12 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 30 atomic % Ni, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         13 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         14 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         15 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 30 atomic % Ni, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         16 . A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 30 atomic % Ni, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.  
     
     
         17 . A method of producing a Co-base target, which comprises: 
 melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy,    subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy, and    sintering the thus obtained alloy powder.    
     
     
         18 . A method of producing a Co-base target, which comprises: 
 melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy,    subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy,    mixing the Co-base alloy powder and another metal powder, and    sintering the thus obtained mixed powder.    
     
     
         19 . A method of producing a Co-base target, which comprises: 
 melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy,    subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy,    mixing the Co-base alloy powder and a metal    powder of at least one element selected from the group consisting of Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and Pt, and    sintering the thus obtained mixed powder.    
     
     
         20 . A method of producing a Co-base target according to  claim 17 ,  18 ,  19 , which comprises: 
 melting a Co-base alloy and an additive B (boron) in an amount of from more than 10 atomic % to 25 atomic %, whereby deoxidizing the Co-base alloy.    
     
     
         21 . A method according to  claim 18 , wherein the thus obtained sintered product is subjected to a heat treatment.  
     
     
         22 . A method according to  claim 19 , wherein the thus obtained sintered product is subjected to a heat treatment.  
     
     
         23 . A method according to  claim 17 , wherein the rapid cooling treatment is conducted by the atomizing process.  
     
     
         24 . A method according to  claim 18 , wherein the rapid cooling treatment is conducted by the atomizing process.  
     
     
         25 . A method according to  claim 19 , wherein the rapid cooling treatment is conducted by the atomizing process.  
     
     
         26 . A method according to  claim 17 , wherein the sintering is conducted by the Hot Isostatic Pressing method.  
     
     
         27 . A method according to  claim 18 , wherein the sintering is conducted by the Hot Isostatic Pressing method.  
     
     
         28 . A method according to  claim 19 , wherein the sintering is conducted by the Hot Isostatic Pressing method.