US2002110703A1PendingUtilityA1
Organic electroluminescent device with self-aligned insulating fillers and method for manufacturing the same
Est. expiryFeb 15, 2021(expired)· nominal 20-yr term from priority
H05B 33/22Y10T428/24669Y10T428/2457H10K 2102/341H10K 59/17H10K 71/00H10K 71/221
40
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
In an organic electroluminescent device, a plurality of striped lower electrodes are formed on an insulating substrate, and a plurality of fillers made of amorphous carbon are filled between the lower electrodes. Organic thin film layers including an emitting layer is formed on the fillers and the lower electrodes. A plurality of striped upper electrodes are formed on the organic thin film layer along a second direction different from the first direction.
Claims
exact text as granted — not AI-modified1 . An organic electroluminescent device comprising:
an insulating substrate; a plurality of striped lower electrodes formed on said insulating substrate; a plurality of filters made of amorphous carbon filled between said lower electrodes; at least one organic thin film layer including an emitting layer formed on said fillers and said lower electrodes; and a plurality of striped upper electrodes formed on said organic thin film layer along a second direction different from said first direction.
2 . The organic electroluminescent device as set forth in claim 1 , wherein said lower electrodes are anodes and said upper electrodes are cathodes.
3 . The organic electroluminescent device as set forth in claim 2 , further comprising a hole-transporting layer between said lower electrodes and said emitting layer.
4 . The organic electroluminescent device as set forth in claim 2 , further comprising an electron-transporting layer between said emitting layer and said upper electrodes.
5 . The organic electroluminescent device as set forth in claim 1 , wherein said insulating substrate is transparent and said lower electrodes comprise transparent conductive layers.
6 . The organic electroluminescent device as set forth in claim 5 , wherein said transparent conductive layers comprise indium tin oxide.
7 . The organic electroluminescent device as set forth in claim 1 , wherein said first direction is approximately normal to said second direction.
8 . A method for manufacturing an organic electroluminescent device, comprising the steps of:
forming a conductive layer on an insulating substrate; forming a photoresist pattern layer having a plurality of striped elements on said conductive layer; etching said conductive layer by a dry etching process using a first plasma gas and using said photoresist pattern layer as an etching mask in a chamber to form striped lower electrodes; depositing an insulating layer on said photoresist pattern layer and on said insulating substrate between said lower electrodes by a plasma deposition process using a second plasma gas in said chamber; performing a lift-off operation upon said photoresist pattern layer to remove said photoresist pattern layer and a part of said insulating layer on said photoresist pattern layer; forming at least one organic thin film layer including an emitting layer on said insulating layer and said lower electrodes; and forming a plurality of striped upper electrodes on said organic thin film layer along a second direction different from said first direction.
9 . The method as set forth in claim 8 , wherein a condition for introducing said first plasma gas is the same as a condition for introducing said second plasma gas.
10 . The method as set forth in claim 9 , wherein each of said first and second plasma gas includes hydrocarbon gas.
11 . The method as set forth in claim 8 , wherein a condition for introducing said first plasma gas is different from a condition for introducing said second plasma gas.
12 . The method as set forth in claim 11 , wherein said first plasma gas includes halogen gas, and said second plasma gas includes hydrocarbon gas.
13 . The method as set forth in claim 8 , wherein said lower electrodes are anodes and said upper electrodes are cathodes.
14 . The method as set forth in claim 13 , further comprising a step of forming a hole-transporting layer between said lower electrodes and said emitting layer.
15 . The method as set forth in claim 13 , further comprising a step of forming an electron-transporting layer between said emitting layer and said upper electrodes.
16 . The method as set forth in claim 8 , wherein said insulating substrate is transparent and said lower electrodes comprise transparent conductive layers.
17 . The method as set forth in claim 16 , wherein said transparent conductive layers comprise indium tin oxide.
18 . The method as set forth in claim 8 , wherein said first direction is approximately normal to said second direction.
19 . The method as set forth in claim 8 , wherein said insulating layer comprises amorphous carbon.
20 . A method for manufacturing an organic electroluminescent device, comprising the steps of:
forming a conductive layer on an insulating substrate; forming a photoresist pattern layer having a plurality of striped elements on said conductive layer; etching said conductive layer by a dry etching process using gas including hydrocarbon gas and using said photoresist pattern layer as an etching mask in a chamber to form striped lower electrodes, and subsequently depositing an insulating layer on said photoresist pattern layer and on said insulating substrate between said lower electrodes by a plasma deposition process using said gas including hydrocarbon gas in said chamber; performing a lift-off operation upon said photoresist pattern layer to remove said photoresist pattern layer and a part of said insulating layer on said photoresist pattern layer, forming at least one organic thin film layer including an emitting layer on said insulating layer and said lower electrodes; and forming a plurality of striped upper electrodes on said organic thin film layer along a second direction different from said first direction.
21 . A method for manufacturing an organic electroluminescent device, comprising the steps of:
forming a conductive layer on an insulating substrate; forming a photoresist pattern layer having a plurality of striped elements on said conductive layer; etching said conductive layer by a dry etching process using a gas including halide gas and using said photoresist pattern layer as an etching mask in a chamber to form striped lower electrodes; depositing an insulating layer on said photoresist pattern layer and on said insulating substrate between said lower electrodes by a plasma deposition process using a gas including hydrocarbon gas in said chamber; performing a lift-off operation upon said photoresist pattern layer to remove said photoresist pattern layer and a part of said insulating layer on said photoresist pattern layer; forming at least one organic thin film layer including an emitting layer on said insulating layer and said lower electrodes; and forming a plurality of striped upper electrodes on said organic thin film layer along a second direction different from said first direction.Join the waitlist — get patent alerts
Track US2002110703A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.