Method for forming carbonaceous hard films

Abstract

A method for enabling the formation of a carbonaceous hard film having a high hardness, strong adherence to the substrate, a wide range of substrate compatibility, and structural stability, which can be formed at room temperature and may cover a large area. The method includes vapor depositing a hard film of a carbonaceous material onto a substrate under vacuum by depositing a vaporized, hydrogen free carbonaceous material, which may be ionized or non-ionized, onto the substrate surface while irradiating the carbonaceous material with gas cluster ions, generated by ionizing gas clusters to form the film.

What is claimed is:  
     
         1 . A carbonaceous hard film vapor phase-formed on a substrate material and having a Vickers hardness of 4,000 kg/mm 2  or more and a coefficient of friction of 0.15 or less.  
     
     
         2 . A carbonaceous hard film of  claim 1  wherein said film does not contain hydrogen.