Perfluoride processing apparatus

Abstract

A plurality of etchers such as poly-etchers 3 or the like are installed within a clean room 2. A duct 7 that is connected to all the etchers is connected to a PFC decomposition device 9, which is installed outside of the clean room 2. An exhaust gas which contains PFC as drained out of all the etchers within the clean room 2 is supplied by the duct 7 to the inner space of PFC decomposition device 9. After having heated up within the PFC decomposition device 9, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device 9. It is no longer required to provide a space for installation of the PFC decomposition device 9 in the clean room 2 with the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or “downsizing” of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.

What is claimed is:  
     
         1 . A perfluoride processing apparatus characterized by comprising an exhaust gas pipe connected to a plurality of semiconductor fabrication apparatuses installed within a clean room with perfluoride supplied thereto for permitting flow of an exhaust gas containing therein said perfluoride as drained out of the semiconductor fabrication apparatuses, and a perfluoride decomposition device connected to said exhaust gas pipe and installed outside of said clean room for decomposing said perfluoride as contained in said exhaust gas to be guided by said exhaust gas pipe.  
     
     
         2 . The perfluoride processing apparatus as recited in  claim 1 , wherein said exhaust gas pipe is connected to all of said semiconductor fabrication apparatuses as installed in said clean room with said perfluoride supplied thereto.  
     
     
         3 . The perfluoride processing apparatus as recited in  claim 1 , wherein said apparatus further comprises an exhaust gas flow path changing device provided at said exhaust gas pipe on the upstream side of said perfluoride decomposition device, and a bypass pipe connected to said exhaust gas flow path changing device for bypassing said perfluoride decomposition device to be coupled to an acidic gas removing device of factory acidic gas processing equipment.  
     
     
         4 . The perfluoride processing apparatus as recited in  claim 1 , wherein an exhaust pipe is provided for introducing an exhaust gas as drained out of said perfluoride decomposition device to said acidic gas removing device.  
     
     
         5 . The perfluoride processing apparatus as recited in any one of the preceding  claims 1  to  4 , wherein said perfluoride decomposition device includes a heating unit having a first heater device with said exhaust gas supplied to said heating unit and a reaction unit having a second heating device and a catalytic layer with said exhaust gas as heated up by said heating unit being supplied thereto.  
     
     
         6 . The perfluoride processing apparatus as recited in any one of the preceding  claims 1  to  4 , wherein said perfluoride decomposition device comprises a solid component removing device with said exhaust gas supplied thereto, a reaction unit for decomposing perfluoride to which said exhaust gas drained out of said solid component removing device is supplied and in which a catalytic layer is provided, and an acidic substance removing device for removal of any acidic substance being contained in said exhaust gas as drained out of said reaction unit.  
     
     
         7 . The perfluoride processing apparatus as recited in  claim 6 , wherein the apparatus comprises a water supply device for supplying at least water in contact with said exhaust gas to said solid component removing device and said acidic substance removing device respectively.  
     
     
         8 . The perfluoride processing apparatus as recited in any one of the preceding  claims 1  to  4 , wherein said perfluoride decomposition device comprises a reaction unit for decomposing said perfluoride, in which unit a catalytic layer provided and to which said exhaust gas is supplied, and an acidic substance removing device for removing reaction products as produced by reaction of acidic material contained in said exhaust gas drained out of said reaction unit with Ca salts.  
     
     
         9 . A perfluoride processing apparatus characterized by comprising an exhaust gas pipe connected to a plurality of liquid crystal manufacturing apparatuses installed within a clean room with perfluoride supplied thereto for permitting flow of an exhaust gas containing therein said perfluoride as drained out of the liquid crystal manufacturing apparatuses, and a perfluoride decomposition device connected to said exhaust gas pipe and installed outside of said clean room for decomposing said perfluoride as contained in said exhaust gas to be guided by said exhaust gas pipe.  
     
     
         10 . The perfluoride processing apparatus as recited in  claim 9 , wherein said exhaust gas pipe is connected to all of said liquid crystal manufacturing apparatuses as installed in said clean room with said perfluoride supplied thereto.  
     
     
         11 . The perfluoride processing apparatus as recited in  claim 9 , wherein said apparatus further comprises an exhaust gas flow path changing device provided at said exhaust gas pipe on the upstream side of said perfluoride decomposition device, and a bypass pipe connected to said exhaust gas flow path changing device for bypassing said perfluoride decomposition device to be coupled to an acidic gas removing device of factory acidic gas processing equipment.  
     
     
         12 . The perfluoride processing apparatus as recited in  claim 9 , wherein an exhaust pipe is provided for introducing an exhaust gas as drained out of said perfluoride decomposition device to said acidic gas removing device.  
     
     
         13 . The perfluoride processing apparatus as recited in any one of the preceding  claims 9  to  12 , wherein said perfluoride decomposition device includes a heating unit having a first heater device with said exhaust gas supplied to said heating unit and a reaction unit having a second heating device and a catalytic layer with said exhaust gas as heated up by said heating unit being supplied thereto.  
     
     
         14 . The perfluoride processing apparatus as recited in any one of the preceding  claims 9  to  12 , wherein said perfluoride decomposition device comprises a solid component removing device with said exhaust gas supplied thereto, a reaction unit for decomposing perfluoride to which said exhaust gas drained out of said solid component removing device is supplied and in which a catalytic layer is provided, and an acidic substance removing device for removal of any acidic substance being contained in said exhaust gas as drained out of said reaction unit.  
     
     
         15 . The perfluoride processing apparatus as recited in  claim 14 , wherein the apparatus comprises a water supply device for supplying at least water in contact with said exhaust gas to said solid component removing device and said acidic substance removing device respectively.  
     
     
         16 . The perfluoride processing apparatus as recited in any one of the preceding  claims 9  to  12 , wherein said perfluoride decomposition device comprises a reaction unit for decomposing said perfluoride, in which unit a catalytic layer provided and to which said exhaust gas is supplied, and an acidic substance removing device for removing reaction products as produced by reaction of acidic material contained in said exhaust gas drained out of said reaction unit with Ca salts.  
     
     
         17 . A perfluoride decomposition device characterized by comprising a reaction unit in which a catalytic layer is provided and to which an exhaust gas containing therein a perfluoride is supplied, said reaction unit decomposing said perfluoride, and an acidic substance removing device for removal of a secondary reactive product as produced by reaction with Ca salts of an acidic substance being contained in said exhaust gas as drained out of said reaction unit.  
     
     
         18 . The perfluoride decomposition device as recited in  claim 17 , wherein said device has a reactive product removing device for removing a secondary reactive product to be produced by reaction with Ca salts of the substance contained in said exhaust gas to generate solid matter due to reaction with water and wherein said exhaust gas drained out of said reactive product removing device is supplied to said reaction unit.  
     
     
         19 . A perfluoride processing method for use with a plurality of semiconductor fabrication apparatuses installed within a clean room for receiving perfluoride as supplied thereto, characterized by comprising the steps of supplying exhaust gases containing said perfluoride as drained out of the semiconductor fabrication apparatuses to a perfluoride decomposition device installed outside of said clean room and then decomposing said perfluoride by said perfluoride decomposition device.  
     
     
         20 . A perfluoride processing method according to  claim 19 , wherein a decomposing method of a perfluoride substance is a catalyst method.  
     
     
         21 . A perfluoride processing method according to  claim 19 , wherein an acid gas in an exhaust gas after a decomposing of a perfluoride substance is removed by using Ca soft powders or particles  
     
     
         22 . A perfluoride processing method according to  claim 21 , wherein said Ca soft powders are Ca(OH) 2 .  
     
     
         23 . A perfluoride processing method according to  claim 21 , wherein under a high temperature condition of more than 200° C., said acid gas in the exhaust gas after the decomposing of said perfluoride substance and said Ca soft powders or particles are reacted.  
     
     
         24 . A perfluoride processing method according to  claim 21 , wherein during a reaction time of said perfluoride substance reaction water is added.  
     
     
         25 . A perfluoride processing method for use with a plurality of liquid crystal manufacturing apparatuses installed within a clean room for receiving perfluoride as supplied thereto, characterized by comprising the steps of supplying exhaust gases containing said perfluoride as drained out of the liquid crystal manufacturing apparatuses to a perfluoride decomposition device installed outside of said clean room and then decomposing said perfluoride by said perfluoride decomposition device.  
     
     
         26 . A perfluoride processing method according to  claim 25 , wherein a decomposing method of a perfluoride substance is a catalyst method.  
     
     
         27 . A perfluoride processing method according to  claim 25 , wherein an acid gas in an exhaust gas after a decomposing of a perfluoride substance is removed by using Ca soft powders or particles  
     
     
         28 . A perfluoride processing method according to  claim 25 , wherein said Ca soft powders are Ca(OH) 2 .  
     
     
         29 . A perfluoride processing method according to  claim 27 , wherein under a high temperature condition of more than 200° C., said acid gas in the exhaust gas after the decomposing of said perfluoride substance and said Ca soft powders or particles are reacted.  
     
     
         30 . A perfluoride processing method according to  claim 27 , wherein during a reaction time of said perfluoride substance reaction water is added.