US2004008963A1PendingUtilityA1
Optical device, method for producing the same, and method for producing polyimide film
Est. expiryMar 31, 2019(expired)· nominal 20-yr term from priority
G02B 6/138G02B 1/046
43
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Claims
Abstract
A method for producing an optical device having a polyimide film through which a light beam is transmitted, which comprises applying a solution containing a polyamic film-forming starting material on a substrate and then baking the resultant under vacuum to form the polyimide film.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method for producing an optical device having an organic polymer film through which a light beam is transmitted, which comprises
applying a solution containing an organic polymer film-forming starting material on a substrate to form the applied film, and then baking the applied film under vacuum of 1 Torr or lower to form the organic polymer film,
wherein the organic polymer film has a high transmittance when the light beam has a wavelength of 1.5 μm or shorter.
2 . A method for producing an optical device having an organic polymer film through which a light beam is transmitted, which comprises
applying a solution containing an organic polymer film-forming starting material on a substrate to form the applied film, and then baking the applied film under gaseous nitrogen to form the organic polymer film,
wherein the organic polymer film has a high transmittance when the light beam has a wavelength of 1.5 μm or shorter.
3 . A method according to claim 1 , wherein the organic polymer film has an absorptivity coefficient of light of not more than 1.6 mm −1 in the wavelength of 650 nm.
4 . A method according to claims 1 or 2 , wherein the light beam has a wavelength of 500 nm to 800 nm.
5 . A method according to claims 1 or 2 , wherein the organic polymer film is a polyimide resin film.
6 . A method according to claim 1 , wherein the polyimide resin film is a photosensitive polyimide resin film.
7 . A method according to claim 2 , wherein the polyimide resin film is a photosensitive polyimide resin film.
8 . A method according to claim 1 , wherein the organic polymer film has a thickness not less than 5 μm and not more than 200 μm.
9 . A method according to claim 1 , wherein the applied film is preparatorily heated under atmospheric pressure, before the baking under vacuum.
10 . A method according to claim 1 , wherein the baking is performed under a vacuum of 1×10 −2 Torr.
11 . A method according to claim 6 , wherein the photosensitive polyimide type resin film is an acetophenone type resin film.
12 . A method according to claim 6 , wherein the photosensitive polyimide type resin film includes a tertiary amine.
13 . A method according to claim 1 , wherein the organic polymer film-forming starting material is a precursor of a polyimide type resin.Join the waitlist — get patent alerts
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