US2004048559A1PendingUtilityA1

Chemical mechanical polishing pad with micro-holes

Priority: Aug 2, 2001Filed: Aug 29, 2001Published: Mar 11, 2004
Est. expiryAug 2, 2021(expired)· nominal 20-yr term from priority
H10P 50/00B24B 37/26
36
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Claims

Abstract

Disclosed is a chemical mechanical polishing pad formed at a polishing surface thereof with micro-holes each having a desired cross-sectional area while having a desired depth. The shape, size, and density of the micro-holes can be optionally adjusted. The chemical mechanical polishing pad provides an effect of maintaining a desired polishing rate during a polishing process. In accordance with the present invention, the micro-holes can have diverse arrangements depending on given process conditions.

Claims

exact text as granted — not AI-modified
1 . A chemical mechanical polishing pad formed, at a polishing surface thereof, with micro-holes each having a desired depth and a desired uniform cross-sectional area.  
     
     
         2 . The chemical mechanical polishing pad according to  claim 1 , wherein each of the micro-holes has a cross-sectional shape corresponding to a circular shape, an oval shape, a triangular shape, a rectangular or square shape, a polygonal shape, or a star shape.  
     
     
         3 . The chemical mechanical polishing pad according to  claim 1 , wherein the cross-sectional area of each of the micro-holes ranges from 10 m 2  to 10 mm 2 .  
     
     
         4 . The chemical mechanical polishing pad according to  claim 1 , wherein each of the micro-holes extends in a direction perpendicular to or inclined from the polishing surface.  
     
     
         5 . The chemical mechanical polishing pad according to  claim 1 , wherein the depth of each of the micro-holes has a ratio ranging from 0.01:1 to 1:1 with respect to a thickness of the pad.  
     
     
         6 . The chemical mechanical polishing pad according to any one of  claims 1  to  5 , wherein the pad is divided into at least two micro-hole regions where the micro-holes are distributed while having different cross-sectional areas, different shapes, and/or different densities, respectively.  
     
     
         7 . The chemical mechanical polishing pad according to any one of  claims 1  to  5 , wherein the micro-holes are formed by a laser.

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