Alloy target used for producing flat panel displays

Abstract

The present invention is related to an alloy target used for producing thin film electrodes, consisting of silver (Ag), copper (Cu), and at least one precious metal selected from the group consisting of palladium (Pd), gold (Au) and platinum (Pt); wherein the mole ratio of said silver ranges from 0.8 to 0.999; the mole ratio of said copper ranges from 0.001 to 0.1; the mole ratio of said precious metal ranges from 0.001 to 0.1; and the total mole ratio of said alloy target is 1.

What is claimed is:  
     
         1 . An alloy target used for producing a flat panel display, comprising: silver (Ag), copper (Cu), and at least one precious metal selected from the group consisting of palladium (Pd), gold (Au) and platinum (Pt); 
 wherein the mole ratio of said silver ranges from 0.8 to 0.999;    the mole ratio of said copper ranges from 0.001 to 0.1;    the mole ratio of said precious metal ranges from 0.001 to 0.1; and    the total mole ratio of said alloy target is 1.    
     
     
         2 . The alloy target as claimed in  claim 1 , wherein said precious metal is palladium (Pd).  
     
     
         3 . The alloy target as claimed in  claim 1 , wherein said precious metal is gold (Au).  
     
     
         4 . The alloy target as claimed in  claim 1 , wherein said precious metal is platinum (Pt).  
     
     
         5 . The alloy target as claimed in  claim 1 , further comprising at least one corrosion-resistance metal; wherein said corrosion-resistance metal is selected from the group consisting of titanium, aluminum, nickel, cobalt, and chromium.  
     
     
         6 . The alloy target as claimed in  claim 5 , wherein said corrosion-resistance metal is titanium, and the mole ratio of said titanium ranges from 0.001 to 0.05.  
     
     
         7 . The alloy target as claimed in  claim 5 , wherein said corrosion 
 resistance metal is aluminum, and the mole ratio of said aluminum ranges from 0.001 to 0.05.    
     
     
         8 . The alloy target as claimed in  claim 5 , wherein said corrosion 
 resistance metal is nickel, and the mole ratio of said nickel ranges from 0.001 to 0.05.    
     
     
         9 . The alloy target as claimed in  claim 5 , wherein said corrosion 
 resistance metal is cobalt, and the mole ratio of said cobalt ranges from 0.001 to 0.05.    
     
     
         10 . The alloy target as claimed in  claim 5 , wherein said corrosion 
 resistance metal is chromium, and the mole ratio of said chromium ranges from 0.001 to 0.05.    
     
     
         11 . The alloy target as claimed in  claim 1 , which is used for depositing the electrodes or conductive wires on a substrate of flat panel display.  
     
     
         12 . A process for manufacturing alloy targets used for producing a flat panel display, comprising the following steps: 
 (a) mixing a composition comprising silver (Ag), copper (Cu), and at least one precious metal, and then melting said composition via electric arc to form a master alloy; wherein the mole ratio of said silver ranges from 0.8 to 0.999; the mole ratio of said copper ranges from 0.001 to 0.1; the mole ratio of said precious metal ranges from 0.001 to 0.1; and at least one precious metal selected from the group consisting of palladium (Pd), golden (Au) and platinum (Pt);    (b) mixing silver and said master alloy for vacuum melting and producing ingots; and    (c) forging, thermal rolling and thermal treating said ingots to form the alloy target.    
     
     
         13 . The process as claimed in  claim 12 , wherein said master alloy in step (a) further comprises at least one corrosion-resistance metal; wherein said corrosion-resistance metal is selected from the group consisting of titanium, aluminum, nickel, cobalt, and chromium.  
     
     
         14 . The process as claimed in  claim 13 , wherein said corrosion-resistance metal in step (a) is titanium, and the mole ratio of said titanium ranges from 0.001 to 0.05.  
     
     
         15 . The process as claimed in  claim 13 , wherein said corrosion resistance metal in step (a) is aluminum, and the mole ratio of said aluminum ranges from 0.001 to 0.05.  
     
     
         16 . The process as claimed in  claim 13 , wherein said corrosion-resistance metal in step (a) is nickel, and the mole ratio of said nickel ranges from 0.001 to 0.05.  
     
     
         17 . The process as claimed in  claim 13 , wherein said corrosion-resistance metal in step (a) is cobalt, and the mole ratio of said cobalt ranges from 0.001 to 0.05.  
     
     
         18 . The process as claimed in  claim 13 , wherein said corrosion-resistance metal in step (a) is chromium, and the mole ratio of said chromium ranges from 0.001 to 0.05.