Method for fabricating an anti-glare pixel-defining layer on an OLED panel

Abstract

A method of the invention for forming a pixel-defining layer on an OLED panel is disclosed. The method of the invention for forming a pixel-defining layer on an OLED panel, comprising following steps: (A) providing a substrate; (B) forming a plurality of first electrodes on said substrate; (C) coating a layer of anti-glare compositions comprising non-photosensitive polyimide and light-absorbing pigments or dyes on said substrate; (D) first prebaking said substrate with said layer of said anti-glare compositions; (E) coating a layer of photoresist compositions on said layer of anti-glare compositions; (F) second prebaking said substrate with said anti-glare compositions and said photoresist; (G) forming patterns of said photoresist through exposing said substrate to masked radiation, developing said photoresist on said substrate, etching said layer of said anti-glare compositions and said photoresist at the same time to form patterned layers of said anti-glare polyimide or polyimide precursor compositions and patterned photoresist; and (I) baking said substrate with said patterned anti-glare polyimide or polyimide precursor compositions for crosslinking or curing to form said anti-glare pixel-defining layers.

What is claimed is:  
     
         1 . A method for forming anti-glare pixel-defining layers on an OLED panel, comprising following steps: 
 (A) providing a substrate;    (B) forming a plurality of first electrodes on said substrate;    (C) coating a layer of anti-glare compositions comprising at least (1) non-photosensitive polyimide or polyimide precursor and (2) light-absorbing pigments or dyes on said substrate or selectively on said first electrodes;    (D) first prebaking said substrate with said layer of said anti-glare compositions;    (E) coating a layer of photoresist compositions on said layer of anti-glare compositions;    (F) second prebaking said substrate with said anti-glare compositions and said photoresist;    (G) forming patterns of said photoresist through exposing said substrate to masked radiation, developing said photoresist on said substrate, etching said layer of said anti-glare compositions and said photoresist at the same time to form patterned layers of said anti-glare polyimide or polyimide precursor compositions and patterned photoresist; wherein said patterns of said photoresist are as same as said patterns of said layers of said anti-glare polyimide or polyimide precursor compositions;    (H) releasing or stripping said photoresist; and    (I) baking said substrate with said patterned anti-glare polyimide or polyimide precursor compositions for crosslinking or curing said patterned anti-glare polyimide or polyimide precursor compositions to form said anti-glare pixel-defining layers;    wherein said patterns of said layer of said anti-glare polyimide or polyimide precursor compositions divide said first electrodes into a plurality of open areas which are not covered by said anti-glare pixel-defining layers.    
     
     
         2 . The method as claimed in  claim 1 , further comprising forming parallel photoresist ramparts having T-top shape cross-section selectively on said anti-glare polyimide pixel-defining layer, on said first electrodes, or on said substrate.  
     
     
         3 . The method as claimed in  claim 1 , wherein said substrate with patterned anti-glare polyimide or polyimide precursor compositions is baked at a temperature which is at least higher than 200° C.  
     
     
         4 . The method as claimed in  claim 1 , wherein said patterns of said anti-glare pixel-defining layers are parallel stripes and said parallel stripes of anti-glare pixel-defining layers intersect with said first electrodes perpendicularly.  
     
     
         5 . The method as claimed in  claim 2 , wherein said ramparts of photoresist intersect with said first electrodes perpendicularly.  
     
     
         6 . The method as claimed in  claim 2 , wherein said photoresist of said ramparts is positive photoresist.  
     
     
         7 . The method as claimed in  claim 1 , further comprising (J) forming a plurality of ramparts on said substrate and selectively on said first electrodes or said stripes of said anti-glare polyimide pixel-defining layer; wherein each rampart protrudes from said substrate and has overhanging portion projecting in a direction parallel to said substrate.  
     
     
         8 . The method as claimed in  claim 1 , wherein further comprising 
 (K) depositing organic electroluminescent media to the exposed area between said ramparts on said substrate or said first electrodes; and    (L) forming a plurality of second electrodes on said organic electroluminescent media on said substrate or said first electrodes.    
     
     
         9 . The method as claimed in  claim 1 , wherein said first electrodes are perpendicular to said second electrodes.  
     
     
         10 . The method as claimed in  claim 1 , wherein said first electrodes are transparent.  
     
     
         11 . The method as claimed in  claim 1 , wherein said substrate is transparent.  
     
     
         12 . The method as claimed in  claim 1 , wherein further comprising forming a plurality of auxiliary electrodes on or beneath the surface of said substrate before forming a plurality of said first electrodes on said substrate.  
     
     
         13 . An OLED panel, comprising: 
 a substrate;    a plurality of first electrodes in parallel stripes, said first electrodes locating on the surface of said substrate;    a plurality of anti-glare polyimide pixel-defining layers, said anti-glare polyimide pixel-defining layers selectively locating on said substrate or on said first electrodes, and said anti-glare polyimide pixel-defining layers comprising at least (1) non-photosensitive polyimide or polyimide precursor and (2) light-absorbing pigments or dyes;    a plurality of photoresist ramparts, said photoresist ramparts selectively locating on said first electrodes or on said pixel-defining layer;    a plurality of organic electroluminescent media, said organic electroluminescent media locating in the exposed area between said ramparts on said substrate; and    a plurality of second electrodes, said second electrodes locating on said organic electroluminescent media;    wherein each said ramparts protruding from said substrate and having an overhanging portion projection in a direction parallel to said substrate; and said photoresist ramparts are formed through coating a compositions of photoresist on said substrate, exposing said substrate to masked radiation and development.    
     
     
         14 . The OLED panel as claimed in  claim 13 , wherein said photoresist ramparts have T-shape cross-section.  
     
     
         15 . The OLED panel as claimed in  claim 13 , wherein said polyimide pixel-defining layers are parallel stripes; and said pixel-defining stripes intersect with said first electrodes perpendicularly.  
     
     
         16 . The OLED panel as claimed in  claim 15 , wherein said photoresist ramparts intersect with said first electrodes perpendicularly.  
     
     
         17 . The OLED panel as claimed in  claim 13 , wherein said photoresist is positive photoresist.  
     
     
         18 . The OLED panel as claimed in  claim 13 , wherein said first electrodes are perpendicular to said second electrodes.  
     
     
         19 . The OLED panel as claimed in  claim 13 , wherein said first electrodes are transparent.  
     
     
         20 . The OLED panel as claimed in  claim 13 , wherein said substrate are transparent.  
     
     
         21 . The OLED panel as claimed in  claim 13 , wherein said substrate has a plurality of auxiliary electrodes on or beneath said surface of said substrate.