US2004082278A1PendingUtilityA1
Processing tool, method of producing processing tool, processing method and processing apparatus
Priority: Aug 24, 1999Filed: Oct 15, 2003Published: Apr 29, 2004
Est. expiryAug 24, 2019(expired)· nominal 20-yr term from priority
H10P 52/00B24B 21/04B24B 9/065B24B 21/002B24D 3/00B24D 3/34B24B 7/228
42
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Claims
Abstract
A processing tool is used to carry out a fixed-abrasive grinding process on a surface of a silicon work-piece. The processing tool includes abrasive grains made up silica grains. A primary average grain size of the silica grains is desirably 0.8 nm to 10 μm.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A processing tool for carrying out a fixed-abrasive grinding process on a surface of a silicon work-piece, comprising:
abrasive grains made up silica grains.
2 . The silicon processing tool as claimed in claim 1 , wherein a primary average grain size of the silica grains is 0.8 nm to 10 μm.
3 . The processing tool as claimed in claim 1 , wherein a content of the silica grains in the abrasive grains is 10 to 70 volume percent.
4 . The processing tool as claimed in claim 1 , further comprising:
a binder bonding the abrasive grains, said binder being made of a material which generates no endothermic reaction during the process carried out on the silicon work-piece.
5 . The processing tool as claimed in claim 1 , further comprising:
an additive mixed to the abrasive grains, said additive being made of a material which generates no endothermic reaction during the process carried out on the silicon work-piece.
6 . The processing tool as claimed in claim 1 , wherein the abrasive grains form a grindstone.
7 . The processing tool as claimed in claim 1 , wherein the abrasive grains form a film.
8 . The processing tool as claimed in claim 7 , wherein the film is flexible.
9 . A method of producing a processing tool having abrasive grains for carrying out a fixed-abrasive grinding process on a surface of a silicon work-piece, said method comprising the step of:
(a) mixing a binder and silica grains to form a mixture; and (b) forming the mixture into the abrasive grains of the processing tool.
10 . The method of producing the processing tool as claimed in claim 9 , wherein said step (a) uses silica grains having a primary average grain size of 0.8 nm to 10 μm.
11 . The method of producing the processing tool as claimed in claim 9 , wherein said step (a) uses a content of the silica grains in the abrasive grains in a range of 10 to 70 volume percent.
12 . The method of producing the processing tool as claimed in claim 9 , wherein said step (a) uses a binder made of a material which generates no endothermic reaction during the process carried out on the silicon work-piece by the processing tool.
13 . A processing method for carrying out a fixed-abrasive grinding process on a surface of a silicon work-piece, comprising the steps of:
(a) positioning the silicon work-piece relative to a processing tool having abrasive grains made up silica grains; and (b) processing the surface of the silicon work-piece by the abrasive grains of the processing tool.
14 . The processing method as claimed in claim 13 , wherein the silica grains have a primary average grain size of 0.8 nm to 10 μm.
15 . The processing method as claimed in claim 13 , wherein a content of the silica grains in the abrasive grains in a range of 10 to 70 volume percent.
16 . The processing method as claimed in claim 13 , wherein the tool includes a binder which bonds the abrasive grains and is made of a material which generates no endothermic reaction during the process carried out on the silicon work-piece.
17 . A processing method for carrying out a process on a disk-shaped or donut-shaped work-piece, comprising the steps of:
(a) grinding an outer peripheral surface of the work-piece by a grindstone; and (b) polishing cutout part on the outer peripheral surface of the work-piece and/or an inner peripheral surface of the work-piece by a polishing film.
18 . The processing method as claimed in claim 17 , wherein said step (a) uses a grindstone including abrasive grains which generate mechano-chemical reaction with respect to a processing surface of the work-piece.
19 . The processing method as claimed in claim 18 , wherein the abrasive grains have a primary average grain size of 0.8 nm to 10 μm.
20 . The processing method as claimed in claim 17 , wherein said step (b) uses a polishing film including abrasive grains which generate mechano-chemical reaction with respect to a processing surface of the work-piece.
21 . The processing method as claimed in claim 20 , wherein said step (b) uses a flexible polishing film.
22 . The processing method as claimed in claim 20 , wherein the abrasive grains have a primary average grain size of 0.8 nm to 10 μm.
23 . The processing method as claimed in claim 17 , wherein said steps (a) and (b) respectively carry out a dry grinding process and a dry polishing process.
24 . A processing apparatus for carrying out a process on a disk-shaped or donut-shaped work-piece, comprising:
a grinding unit grinding an outer peripheral surface of the work-piece by a grindstone; a polishing unit polishing cutout part on the outer peripheral surface of the work-piece and/or an inner peripheral surface of the work-piece by a polishing film; and a transport unit transporting the work-piece at least between the grinding unit and the polishing unit and positioning the work-piece in the grinding unit and the polishing unit.
25 . The processing apparatus as claimed in claim 24 , wherein said grinding unit includes a grindstone having abrasive grains which generate mechano-chemical reaction with respect to a processing surface of the work-piece.
26 . The processing apparatus as claimed in claim 25 , wherein the abrasive grains have a primary average grain size of 0.8 nm to 10 μm.
27 . The processing apparatus as claimed in claim 24 , wherein said polishing unit includes a polishing film having abrasive grains which generate mechano-chemical reaction with respect to a processing surface of the work-piece.
28 . The processing apparatus as claimed in claim 27 , wherein said polishing film is flexible.
29 . The processing apparatus as claimed in claim 27 , wherein the abrasive grains have a primary average grain size of 0.8 nm to 10 μm.
30 . The processing apparatus as claimed in claim 24 , wherein said grinding unit and said polishing unit respectively carry out a dry grinding process and a dry polishing process.Join the waitlist — get patent alerts
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