Reaction product of aqueous copolymer emulsion and polyvalent metal compound and polishing composition containing same
Abstract
A reaction product of (I) an aqueous emulsion of a copolymer of (a) 5-50 wt % of an ethylenically unsaturated carboxylic acid monomer and/or the salt thereof, (b) 0.05-20 wt % of ethylenically unsaturated sulfonic acid monomer and/or the salt thereof, and (c) other ethylenically unsaturated monomers polymerizable with the monomers (a) and (b), provided that the total of monomers (a), (b), and (c) is 100 wt %, the copolymer having a Tg from −30° C. to +20° C., and (II) a polyvalent metal compound. The reaction product is useful as a floor polish excelling in durability, adhesion to substrates, and recoatability that are well balanced with removability with an alkali, and decreased TVOC due to absence or low content of a low boiling point coalescent agent and plasticizer.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A reaction product of (I) an aqueous emulsion of a copolymer of (a) 5-50 wt % of an ethylenically unsaturated carboxylic acid monomer and/or the salt thereof, (b) 0.05-20 wt % of ethylenically unsaturated sulfonic acid monomer and/or the salt thereof, and (c) other ethylenically unsaturated monomers polymerizable with the monomers (a) and (b), provided that the total of monomers (a), (b), and (c) is 100 wt %, the copolymer having a glass transition temperature from −30° C. to +20° C., and (II) a polyvalent metal compound.
2 . The reaction product according to claim 1 , wherein the glass transition temperature of the copolymer is from −20° C. to +20° C.
3 . The reaction product according to claim 1 , wherein the polyvalent metal compound is selected from the group consisting of oxides, hydroxides, carbonates, acetates, hypophosphates, phosphates, and sulfates of calcium, magnesium, zinc, aluminum, tin, tungsten, and zirconium.
4 . The reaction product according to claim 1 , wherein the polyvalent metal compound is selected from the group consisting of calcium hydroxide, calcium acetate, calcium hypophosphate, calcium phosphate, zinc oxide, zinc hydroxide, zinc carbonate, and zinc sulfate.
5 . A polishing composition comprising a reaction product of (I) an aqueous emulsion of a copolymer of (a) 5-50 wt % of an ethylenically unsaturated carboxylic acid monomer and/or the salt thereof, (b) 0.05-20 wt % of ethylenically unsaturated sulfonic acid monomer and/or the salt thereof, and (c) other ethylenically unsaturated monomers polymerizable with the monomers (a) and (b), provided that the total of monomers (a), (b), and (c) is 100 wt %, the copolymer having a glass transition temperature from −30° C. to +20° C., and (II) a polyvalent metal compound.
6 . The polishing composition according to claim 5 , further comprising one or more components selected from the group consisting of other resin emulsion, rubber emulsion, alkali-soluble resin, wax emulsion, coalescent agent, plasticizer, wetting agent, dispersant, leveling agent, and antiseptic agent.
7 . The polishing composition according to claim 6 , wherein other resin emulsion is an emulsion of an acrylic resin having a glass transition temperature from −30° C. to +70° C.
8 . The polishing composition according to claim 7 , wherein the acrylic resin is a copolymer comprising at least one alkyl (meth) acrylate selected from the group consisting of methyl methacrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, i-butyl (meth)acrylate, t-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and cyclohexyl (meth)acrylate.Cited by (0)
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