Planarization composition and method of patterning a substrate using the same
Abstract
The present invention includes a composition and a method for forming a pattern on a substrate with the composition by forming a cross-linked polymer from the composition upon exposing the same to radiation. To that end, in one embodiment of the present invention the composition includes a non-silicon-containing acrylate component, and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps. The initiator component is responsive to radiation to initiate a free radical reaction and cause the non-silicon containing acrylate component to polymerize and cross-link. One embodiment of the non-silicon-containing acrylate component includes ethylene glycol diacrylate. The method includes depositing the composition to function as a planarization layer. Thereafter, a layer of polymerizable material into which a pattern is to be recorded is deposited.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A composition polymerizable in response to radiation being incident thereupon, said composition comprising:
a non-silicon-containing acrylate component; and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps, with said initiator component being responsive to said radiation to initiate a free radical reaction to cause said non-silicon containing acrylate component to polymerize and cross-link.
2 . The composition as recited in claim 1 wherein said non-silicon-containing acrylate component includes ethylene glycol diacrylate.
3 . A method of patterning a layer on a substrate, said method comprising:
forming a layer of polymerizable material on said substrate; forming a planarization layer on said substrate, positioned between said substrate and said layer of polymerizable material, from a composition of a non-silicon-containing acrylate component and an initiator component combined with said non-silicon-containing acrylate to provide a viscosity no greater than 5 cps, and swelling to no greater extent than to have greater than 5% of said layer of polymerizable material penetrate said planarization layer; contacting said layer of polymerizable material with a surface of a mold to conform said layer of polymerizable material to said surface; polymerizing said planarization layer and said layer of polymerizable material by impinging actinic radiation thereupon, to form polymerized layers.
4 . The method as recited in claim 3 wherein forming said planarization layer further includes depositing a mixture of ethylene glycol diacrylate and said initiator on said substrate and contacting said mixture with a surface of a mold, with said surface being substantially planar.
5 . The method as recited in claim 3 further including providing said mold with a pattern, with contacting said layer of polymerizable material further including forming said pattern in said layer of polymerizable material.
6 . The method as recited in claim 5 further including separating said mold from said polymerized layers and subjecting said polymerized layers to an etching environment to transfer said pattern into said substrate.
7 . The method as recited in claim 3 wherein forming said layer of polymerizable material further includes depositing, on said substrate, a mixture having a mono-functional acrylate component, a poly-functional molecule component; and a second initiator component, an initiator component combined with said mono-functional acrylate component and said poly-functional molecule component to provide a viscosity no greater than 2 cps to preferentially wet said surface forming a contact angle therewith no greater than 75°, with said additional initiator component being responsive to said radiation to initiate a free radical reaction to cause said mono-functional acrylate component and said poly-functional molecule component to polymerize and cross-link.
8 . The method as recited in claim 7 further including providing said mixture with a silicon-containing acrylate component, wherein said mono-functional acrylate component is less than 60% of said composition, said silicon-containing acrylate component is less than 50% of said solution, said poly-functional molecule component is less than 20% of said solution and said initiator component is less than 5% of said solution.
9 . The method as recited in claim 7 wherein said mono-functional acrylate component is selected from a set of acrylates consisting of n-butyl acrylate, t-butyl acrylate and methyl methacrylate.
10 . The method as recited in claim 7 wherein said poly-functional molecule component includes a plurality of di-functional molecules.
11 . The method as recited in claim 7 wherein said poly-functional molecule component is selected from a set of di-functional molecules consisting of 1,3-bis (3-methacryloxypropyl) tetramethyldisiloxane and ethylene diol diacrylate.
12 . The method as recited in claim 7 wherein said initiator component consists of molecules selected from a set consisting of 1-hydroxycyclohexyl phenyl ketone, 2-(2-hydroxypropyl) phenyl ketone and phenylbis (2,4,6-trimethyl benzoyl) phosphine oxide.Join the waitlist — get patent alerts
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