US2004134786A1PendingUtilityA1
Mold for a V-groove fiber array base block and fabrication method thereof
Est. expiryAug 28, 2022(expired)· nominal 20-yr term from priority
C25D 1/20C25D 1/10
42
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Claims
Abstract
A V-groove mold fabrication method is disclosed. The method for fabricating a V-groove mold includes the following steps: (a) providing a matrix substrate having a plurality of V-grooves, and then forming a metal layer on said matrix substrate; immersing said matrix substrate having said metal layer thereon with an electroforming metal ion solution and forming a father mold by an electroforming process; and separating said father mold from said matrix substrate.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method for fabricating a mold for a fiber array base block comprising the steps of:
(a) providing a matrix substrate having a plurality of V-grooves, and then forming a metal layer on said matrix substrate; (b) immersing said matrix substrate having said metal layer thereon with an electroforming metal ion solution and forming a father mold by an electroforming process; and (c) separating said father mold from said matrix substrate.
2 . The method as claimed in claim 1 , further comprising:
(d) forming a passive layer on said father mold; (e) forming a mother mold on said passive layer by an electroforming process in an electroforming metal ion solution; and (f) separating said mother mold from said father mold.
3 . The method as claimed in claim 2 , further comprising:
(g) forming a passive layer on said mother mold; (h) forming a son mold on said passive layer by an electroforming process in an electroforming metal ion solution; and (i) separating said son mold from said mother mold; wherein said son mold is taken as a father mold for mass-production.
4 . The method as claimed in claim 1 , wherein the material of said metal layer is selected from the group consisting of copper, nickel, silver, gold, and alloys thereof.
5 . The method as claimed in claim 1 , wherein said metal of said mold formed by said electroforming process is selected from the group consisting of nickel, nickel-containing alloys, silver, copper, gold, chromium, and aluminum.
6 . The method as claimed in claim 2 , wherein said metal of said mold formed by said electroforming process is selected from the group consisting of nickel, nickel-containing alloys, silver, copper, gold, chromium, and aluminum.
7 . The method as claimed in claim 3 , wherein said metal of said mold formed by said electroforming process is selected from the group consisting of nickel, nickel-containing alloys, silver, copper, gold, chromium, and aluminum.
8 . The method as claimed in claim 5 , wherein said nickel-containing alloys comprise nickel-iron alloy, nickel-cobalt alloy, nickel-tungsten alloy, nickel-manganese alloy, Ni—SiC, or Ni—Fe—TiO 2 alloy.
9 . The method as claimed in claim 6 , wherein said nickel-containing alloys comprise nickel-iron alloy, nickel-cobalt alloy, nickel-tungsten alloy, nickel-manganese alloy, Ni—SiC, or Ni—Fe—TiO 2 alloy.
10 . The method as claimed in claim 7 , wherein said nickel-containing alloys comprise nickel-iron alloy, nickel-cobalt alloy, nickel-tungsten alloy, nickel-manganese alloy, Ni—SiC, or Ni—Fe—TiO 2 alloy.
11 . The method as claimed in claim 1 , wherein said electroforming metal ion solution used for electroforming in step (b) is a solution of Ni(NH 2 SO 3 ) 4H 2 O or NiSO 4 .
12 . The method as claimed in claim 2 , wherein said passive layer is formed by exposing said surface of said father mold to plasma, a K 2 Cr 2 O 7 solution or a basic solution.
13 . The method as claimed in claim 12 , wherein said basic solution is Na 2 CO 3 or NaOH.
14 . The method as claimed in claim 3 , wherein said father mold or son mold is applied for injection molding fiber array base blocks.
15 . The method as claimed in claim 3 , wherein said father mold or son mold is applied for press molding fiber array base blocks.
16 . The method as claimed in claim 1 , wherein the thickness of said metal layer ranges from 0.04 μm to 0.2 μm.
17 . The method as claimed in claim 2 , wherein said passive layer is a metal oxide layer.
18 . The method as claimed in claim 1 , wherein sputtering or evaporation forms said metal layer.
19 . The method as claimed in claim 1 , further comprising step (c 1 ) etching said metal layer remaining on said father mold using H 2 O 2 and NH 4 OH after step (c).Cited by (0)
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