[substrate exposure apparatus and method]

Abstract

A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.

1 . A substrate exposure apparatus, applicable to transfer a pattern to a photoresist on a surface of a substrate, the substrate exposure apparatus comprising: 
 a scan light source, disposed at a position spaced from a surface of the photoresist on the substrate with a distance, and the scan light source comprising a plurality of point light sources; and    a scan control system, converting the pattern into a timing signal to control light and dark status of each of the point light sources at different times, the scan control system further allows the substrate exposure apparatus to have a scan function, such that the scan light source scans the photoresist at least once along a scan path for exposure.    
     
     
         2 . The substrate exposure apparatus according to  claim 1 , wherein the substrate includes a printed circuit board.  
     
     
         3 . The substrate exposure apparatus according to  claim 1 , wherein the substrate includes a wafer.  
     
     
         4 . The substrate exposure apparatus according to  claim 1 , wherein the substrate includes various types of package substrates.  
     
     
         5 . The substrate exposure apparatus according to  claim 1 , wherein the point light sources are arranged into one line light source.  
     
     
         6 . The substrate exposure apparatus according to  claim 1 , wherein the point light sources are arranged into a plurality of line light sources.  
     
     
         7 . The substrate exposure apparatus according to  claim 6 , wherein the line light sources are parallel to each other.  
     
     
         8 . The substrate exposure apparatus according to  claim 7 , wherein the point light sources in one of the line light sources has a position shift with respect to the point light source in another line light source along an aligning direction of the point light sources, so that the point light sources are staggered to enhance the exposure resolution.  
     
     
         9 . The substrate exposure apparatus according to  claim 1 , wherein the point light sources include either light emitting diodes or laser diodes.  
     
     
         10 . The substrate exposure apparatus according to  claim 1 , wherein the scan function is achieved by shifting the scan light source.  
     
     
         11 . The substrate exposure apparatus according to  claim 1 , wherein the scan function is achieved by shifting the substrate.  
     
     
         12 . The substrate exposure apparatus according to  claim 1 , further comprising a chaise to carry the substrate.  
     
     
         13 . The substrate exposure apparatus according to  claim 12 , wherein the scan function is achieved by shifting the chaise.  
     
     
         14 . The substrate exposure apparatus according to  claim 1 , further comprising a lens set located along the optical paths between the scan light source and the substrate.  
     
     
         15 . The substrate exposure apparatus according to  claim 14 , wherein the scan function is achieved by rotating at least a component in the lens set.  
     
     
         16 . The substrate exposure apparatus according to  claim 14 , wherein the scan function is achieved by shifting at least a component in the lens set.