Coating device and method

Abstract

A device for coating a film with more than two kinds of thickness, including a turntable, a mask and a coating source. The turntable spins regularly. The shape of the mask depends on the thickness of the film and the mask is set close to the substrate. The coating source is set opposite to the turntable, and the mask is set between the coating source and the turntable. The invention also discloses a method for coating a film with more than two kinds of thickness. The method including setting a substrate on a turntable that spins regularly, setting a mask close to the substrate and coating a film on the substrate by a coating source.

What is claimed is:  
     
         1 . A coating device for coating a film with more than two kinds of thickness on a substrate, including: 
 a turntable, which spins regularly;    a mask, the shape of the mask is determined by the thickness of the film, and the mask is set close to the substrate; and    a coating source, which is set opposite to the turntable, and the mask is set between the coating source and the turntable.    
     
     
         2 . The coating device of  claim 1 , wherein the turntable spins with a constant angular velocity.  
     
     
         3 . The coating device of  claim 1 , wherein the shape of the mask comprises a plurality of concentric circle curves, the radian of the concentric circle curves control the specific thickness of the film.  
     
     
         4 . The coating device of  claim 1 , wherein the coating source is an evaporation source.  
     
     
         5 . The coating device of  claim 1 , wherein the coating source is a sputtering source.  
     
     
         6 . The coating device of  claim 1 , wherein the coating source is a target.