Perfluoride processing apparatus

Abstract

A plurality of etchers such as poly-etchers 3 or the like are installed within a clean room 2. A duct 7 that is connected to all the etchers is connected to a PFC decomposition device 9, which is installed outside of the clean room 2. An exhaust gas which contains PFC as drained out of all the etchers within the clean room 2 is supplied by the duct 7 to the inner space of PFC decomposition device 9. After having heated up within the PFC decomposition device 9, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device 9. It is no longer required to provide a space for installation of the PFC decomposition device 9 in the clean room 2 with the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or “downsizing” of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.

1 - 18 . cancelled.  
     
     
         19 . A perfluoride processing method for use with a plurality of semiconductor fabrication apparatuses installed within a clean room for receiving perfluoride as supplied thereto, comprising the steps of supplying exhaust gases containing said perfluoride as drained out of the semiconductor fabrication apparatuses to a perfluoride decomposition device installed outside of said clean room and then decomposing said perfluoride by said perfluoride decomposition device.  
     
     
         20 . A perfluoride processing method according to  claim 19 , wherein said decomposing step includes a catalyst method.  
     
     
         21 . A perfluoride processing method according to  claim 19 , wherein an acid gas in an exhaust gas after a decomposing of a perfluoride substance is removed by using Ca soft powders or particles.  
     
     
         22 . A perfluoride processing method according to  claim 21 , wherein said Ca soft powders are Ca(OH) 2 .  
     
     
         23 . A perfluoride processing method according to  claim 21 , wherein under a high temperature condition of more than 200° C., said acid gas in the exhaust gas after the decomposing of said perfluoride substance and said Ca soft powders or particles are reacted.  
     
     
         24 . A perfluoride processing method according to  claim 21 , wherein during a reaction time of said perfluoride substance reaction water is added.  
     
     
         25 . A perfluoride processing method for use with a plurality of liquid crystal manufacturing apparatuses installed within a clean room for receiving perfluoride as supplied thereto, comprising the steps of supplying exhaust gases containing said perfluoride as drained out of the liquid crystal manufacturing apparatuses to a perfluoride decomposition device installed outside of said clean room and then decomposing said perfluoride by said perfluoride decomposition device.  
     
     
         26 . A perfluoride processing method according to  claim 25 , wherein said decomposing step includes a catalyst method.  
     
     
         27 . A perfluoride processing method according to  claim 25 , wherein an acid gas in an exhaust gas after a decomposing of a perfluoride substance is removed by using Ca soft powders or particles.  
     
     
         28 . A perfluoride processing method according to  claim 25 , wherein said Ca soft powders are Ca(OH) 2 .  
     
     
         29 . A perfluoride processing method according to  claim 27 , wherein under a high temperature condition of more than 200° C., said acid gas in the exhaust gas after the decomposing of said perfluoride substance and said Ca soft powders or particles are reacted.  
     
     
         30 . A perfluoride processing method according to  claim 27 , wherein during a reaction time of said perfluoride substance reaction water is added.