Apparatus for generating f2 gas method for generating f2 gas and f2 gas

Abstract

An F 2 gas generating apparatus for generating a high purity F 2 gas by subjecting an electrolytic bath made of KF. 2 HF to electrolysis is characterized by comprising a preparing system for preparing KF. 2 HF from KF or KF.HF, an HF supplying system for supplying HF into the electrolytic bath and the preparing system, and an F 2 gas generating system for generating the F 2 gas by subjecting KF. 2 HF prepared by the preparing system to electrolysis.

1 . An F 2  gas generating apparatus for generating an F 2  gas by subjecting an electrolytic bath comprising KF.2HF to electrolysis, being characterized by comprising: 
 a preparing system for preparing KF.2HF from KF or KF.HF;    an HF supplying system for supplying HF into the electrolytic bath and the preparing system; and    an F 2  gas generating system for generating the F 2  gas by subjecting KF.2HF prepared by the preparing system to electrolysis.    
     
     
         2 . The F 2  gas generating apparatus as set forth in  claim 1 , being characterized in that a moisture removing device for removing moisture in said KF or KF.HF is attached to the preparing system.  
     
     
         3 . The F 2  gas generating apparatus as set forth in  claim 1 , wherein an oxygen concentration in the thus-generated F 2  gas is 2% or less.  
     
     
         4 . An F 2  generating apparatus for generating an F 2  gas by subjecting an electrolytic bath comprising KF.2HF to electrolysis, comprising: 
 a preparing system for preparing KF.2HF from KF or KF.HF;    an HF supplying system for supplying HF into the electrolytic bath and the preparing system; and    an F 2  gas generating system for generating the F 2  gas by subjecting KF.2HF prepared by the preparing system to electrolysis, being characterized by being provided with a moisture controlling device for adjusting moisture in an atmosphere outside each of the preparing system, the HF supplying system, and the F 2  gas generating system or all the systems as a whole.    
     
     
         5 . The F 2  gas generating apparatus as set forth in  claim 4 , wherein the moisture controlling device is a box which contains each of the systems or all the systems as a whole and is capable of controlling an atmosphere inside the box.  
     
     
         6 . An F 2  gas generating method for generating an F 2  gas by subjecting an electrolytic bath comprising KF.2HF to electrolysis, comprising the steps of: 
 heat-deaerating KF or KF.HF for a predetermined period of time in an atmosphere of vacuum or an inert gas in a preparing system, for preparing KF.2HF from said KF or KF.HF, which is attached with a moisture removing device for removing moisture in said KF or KF.HF;    cooling said KF or KF.HF to room temperature in an atmosphere of vacuum or the inert gas in the preparing system;    supplying HF changed into a vapor phase from an HF supplying system into said preparing system;    allowing said KF or KF.HF, and said HF to react with each other in the preparing system to generate KF.2HF;    supplying the thus-generated KF.2HF into an electrolytic cell in an F 2  gas generating system; and    Subjecting said KF.2HF to electrolysis to generate an F 2  gas having a low oxygen concentration.    
     
     
         7 . The F 2  gas generating method as set forth in  claim 6 , wherein, in the preparing system, said KF or KF.HF is heated at from 200° C. to 300° C. to remove adsorbed water or crystallization water of said KF or KF.HF therefrom.  
     
     
         8 . An F 2  gas generated by a method comprising the steps of: 
 heat-deaerating KF or KF.HF for a predetermined period of time in an atmosphere of vacuum or an inert gas in a preparing system, for preparing KF.2HF from KF or KF.HF, which is attached with a moisture removing device for removing moisture in said KF or KF.HF;    cooling said KF or KF.HF to room temperature in an atmosphere of vacuum or the inert gas in the preparing system;    supplying HF changed into a vapor phase from an HF supplying system into said preparing system;    allowing said KF or KF-HF, and said HF to react with each other in the preparing system to generate KF.2HF;    supplying the thus-generated KF.2HF into an electrolytic cell in an F 2  gas generating system; and    Subjecting said KF.2HF to electrolysis.    
     
     
         9 . The F 2  gas as set forth in  claim 8 , wherein an oxygen concentration is 2% or less.