Thin film magnetic head and magnetic storage apparatus

Abstract

A thin film magnetic head and a method of manufacture thereof, wherein the head includes a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole. The upper magnetic pole is formed by a sputtered first magnetic layer which is an underlayer and a plated second magnetic layer provided on the sputtered first magnetic layer.

1 . A method for manufacturing a thin film magnetic head including a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein the upper magnetic pole is formed by the steps of: 
 depositing by sputtering a first magnetic layer; and    depositing by electroplating a second magnetic layer on the sputtered first magnetic layer.    
   
   
       2 . A method according to  claim 1 , wherein the sputtered first magnetic layer contains Co, Ni and Fe as 10≦Co≦80 wt %, 0≦Ni≦25%, and 15≦Fe≦90 wt %.  
   
   
       3 . A method according to  claim 1 , wherein the electroplated second magnetic layer contains Co, Ni and Fe as 10≦Co≦80 wt %, 0≦Ni≦25%, 15≦Fe≦90 wt %.  
   
   
       4 . A method according to  claim 1 , wherein the electroplated second magnetic layer is formed by use of a plating bath containing saccharin sodium in a plating solution thereof.  
   
   
       5 . A method according to  claim 4 , wherein the content of the saccharin sodium contained in the plating bath is set to 0.5-2 g/l.  
   
   
       6 . A thin film magnetic head comprising a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein: 
 the upper magnetic pole includes a magnetic underlayer formed on a side facing the magnetic gap layer and a magnetic layer formed on the magnetic underlayer;    wherein a saturation magnetic flux density of the magnetic underlayer is higher than a saturation magnetic flux density of the magnetic layer.    
   
   
       7 . A thin film magnetic head according to  claim 6 , wherein a density of Fe contained in the magnetic underlayer is higher than a density of Fe contained in the magnetic layer.  
   
   
       8 . A thin film magnetic head according to  claim 7 , wherein the magnetic underlayer and the magnetic layer contain CoNiFe or CoFe, and the composition of CoNiFe or CoFe is set as 10≦Co≦80 wt %, 0≦Ni≦25 wt %, and 15≦Fe≦90 wt %.  
   
   
       9 . A thin film magnetic head according to  claim 6 , wherein the magnetic underlayer is a sputtered magnetic underlayer, and the magnetic layer is a plated magnetic layer.  
   
   
       10 . A thin film magnetic head comprising a lower magnetic pole, an upper magnetic pole provided so as to face the lower magnetic pole, and a magnetic gap layer provided between the lower magnetic pole and the upper magnetic pole, wherein: 
 the upper magnetic pole includes a magnetic underlayer formed on a side facing the magnetic gap layer and a magnetic layer formed on the magnetic underlayer;    wherein a density of Fe contained in the magnetic underlayer is higher than a density of Fe contained the magnetic layer.    
   
   
       11 . A thin film magnetic head according to  claim 10 , wherein a saturation magnetic flux density of the magnetic underlayer is higher than a saturation magnetic flux density of the magnetic layer.  
   
   
       12 . A thin film magnetic head according to  claim 10 , wherein the magnetic underlayer and the magnetic layer contain CoNiFe or CoFe, and the composition of CoNiFe or CoFe is set as 10≦Co≦80 wt %, 0≦Ni≦25 wt %, and 15≦Fe≦90 wt %.  
   
   
       13 . A thin film magnetic head according to  claim 10 , wherein the magnetic underlayer is a sputtered magnetic underlayer, and the magnetic layer is a plated magnetic layer.