Cold wall chemical vapor deposition apparatus and cleaning method of a chamber for the same

Abstract

A cold wall chemical vapor deposition apparatus includes: a chamber; a susceptor movable up and down in the chamber by a driving means, the susceptor including a heater and an internal electrode; a heat reflector over the susceptor, the heat reflector reflecting a heat emitted from the heater back to a wafer on the susceptor and serving as an correspondent electrode to the internal electrode; a heater control unit connected to the wafer, the heater and the driving means, the heater control unit sensing a temperature of the wafer, the susceptor moving according to the temperature; a gas supply unit supplying gases to the chamber; and a power source applying a voltage to the chamber.

1 .- 5 . (Cancelled)  
   
   
       6 . A cleaning method of a chamber for a cold wall chemical vapor deposition apparatus, which includes a susceptor having an internal electrode, a heat reflector, a driving means for the susceptor, a power source selectively applying a voltage to the heat reflector or to the internal electrode and a gas supply unit, comprising: 
 supplying cleaning gas from the gas supply unit to the chamber;    applying the voltage to the heat reflector and simultaneously grounding the internal electrode;    applying the voltage to the internal electrode and simultaneously grounding the heat reflector; and    moving the susceptor up and down by the driving means while the voltage is applied to the heat reflector or to the internal electrode.    
   
   
       7 . The method according to  claim 6 , wherein the driving means is a motor.  
   
   
       8 . The method according to  claim 6 , wherein the cold wall chemical vapor deposition apparatus further includes a switch selectively applying the voltage to the heat reflector or to the internal electrode.  
   
   
       9 . A cleaning method of a chamber for a cold wall chemical vapor deposition apparatus, which includes a susceptor having an internal electrode, a heat reflector, a power source selectively applying a voltage to the heat reflector or to the internal electrode and a gas supply unit, comprising: 
 supplying cleaning gas from the gas supply unit to the chamber; and    applying the voltage to the heat reflector.    
   
   
       10 . The method according to  claim 9 , further comprising grounding the internal electrode simultaneously with applying the voltage to the heat reflector.  
   
   
       11 . The method according to  claim 9 , wherein the cold wall chemical vapor deposition apparatus further includes a driving means for the susceptor.  
   
   
       12 . The method according to  claim 11 , wherein the driving means is a motor.  
   
   
       13 . The method according to  claim 11 , further comprising grounding the internal electrode simultaneously with applying the voltage to the heat reflector.  
   
   
       14 . The method according to  claim 6 , wherein the cold wall chemical vapor deposition apparatus further includes a switch selectively applying the voltage to one of the heat reflector and the internal electrode.