Ophthalmic wavefront measuring devices

Abstract

Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.

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       21 . A binocular wavefront aberration measuring apparatus for determining aberration in a pair of eyes, said system comprising: 
 a first ophthalmic wavefront measuring device for measuring the aberrations introduced by a first eye of the pair of eyes:    a second ophthalmic wavefront measuring device for measuring the aberration introduced by a second eye of the pair of eyes; and