Shielding plate in plasma for uniformity improvement

Abstract

An apparatus comprising a plasma chamber containing a plasma for a plasma-assisted material process upon a substrate; a shielding plate within the plasma chamber to actively direct ion flux to desired areas of the substrate; and a supporting structure to support the shielding plate within the chamber is disclosed.

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       20 . A method comprising: 
 actively directing ion flux within a plasma chamber by the insertion of a plate into the chamber; and    regulating ion flux to different areas of the substrate by altering properties of the plate.    
   
   
       21 . The method of  claim 20  further comprising conducting a plasma-assisted etching process upon the substrate.  
   
   
       22 . The method of  claim 20  further comprising conducting a plasma-enhanced chemical vapor deposition process upon the substrate.  
   
   
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