Method for improving well quality

Abstract

A method of improving the quality of liquid coming from a well that has a pump and pipe assembly. The method includes identifying a region of the well that is low in contamination and a region of the well that is high in contamination, and modifying the pump and pipe assembly so that suction of the assembly is enhanced in the region that is low in contamination and inhibited in the region that is high in contamination. Modifying the pump and pipe assembly can include coupling a suction control device to the pump and pipe assembly, and positioning the suction control device in the region of low contamination. In addition, modifying the assembly can include positioning a flow control disk in a location that is substantially between the region of low concentration and the region of high concentration.

1 . A well pump and pipe assembly positioned in a well, comprising: 
 a well having at least two regions of low contamination;    a well pipe positioned in the well;    a well pump coupled to the well pipe; and    a first suction control device coupled to the well pipe and positioned in one of the regions of low contamination, and a second suction control device coupled to the first suction control device and positioned in another of the regions of low contamination.    
   
   
       2 . The well pump and pipe assembly positioned in a well as claimed in  claim 1 , wherein the well includes a region of high contamination, and further comprising flow control disks coupled to the pump and pipe assembly and positioned substantially between a region of low contamination and the region of high contamination.  
   
   
       3 . A well pump and pipe assembly positioned in a well, comprising: 
 a well having a region of low contamination and a region of high contamination;    a well pipe positioned in the well;    a well pump coupled to the well pipe; and    flow control disks coupled to the pump and pipe assembly and positioned substantially between the region of low contamination and the region of high contamination.    
   
   
       4 . The well pump and pipe assembly positioned in a well as claimed in  claim 3 , wherein the flow control disks are substantially annular in shape and substantially fill a gap between the pump and pipe assembly and the wall of the well.