High rate deposition of titanium dioxide

Abstract

There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate.

1 - 22 . (canceled)  
     
     
         23 . An apparatus for forming a titanium oxide film comprising: 
 a first reactant source containing TiCL 4 ;    a second reactant source containing water vapor;    a plasma stream generator; and    a substrate holder.