US2005207960A1PendingUtilityA1
Method for producing a polycrystalline silicon, polycrystalline silicon and solar cell
Est. expiryOct 7, 2022(expired)· nominal 20-yr term from priority
Inventors:Tadashi Saito
H10P 50/642H10F 71/1221Y02P70/50Y02E10/546C30B 11/00C30B 29/06
48
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Claims
Abstract
Silicon raw material and gallium dopant are charged and mixed in a crucible. The silicon raw material is heated to a predetermined temperature, and melted under an inactive gas atmosphere. The melted silicon raw material is cooled down to be crystallized to make a polycrystalline silicon incorporating the gallium dopant.
Claims
exact text as granted — not AI-modified1 . A method for producing polycrystalline silicon, comprising the steps of:
charging and mixing silicon raw material and gallium dopant in a crucible, melting said silicon raw material under an inert gas atmosphere through heating to a predetermined temperature, and cooling down said silicon raw material melted to be crystallized to make a polycrystalline silicon incorporating said gallium dopant.
2 . The producing method as defined in claim 1 , wherein the content of said gallium dopant for said silicon raw material is set within 5×10 −4 -6.3×10 −2 atomic %.
3 . The producing method as defined in claim 1 , wherein the cooling rate for said melted silicon raw material is set to 1° C./min or below.
4 . The producing method as defined in claim 1 , wherein oxygen-including compound is added to said silicon raw material, in addition to said gallium dopant.
5 . The producing method as defined in claim 4 , wherein said oxygen-including compound is silicon oxide.
6 . The producing method as defined in claim 4 , wherein the oxygen content of said polycrystalline silicon is set within 10 16 -10 18 /cm 3 .Join the waitlist — get patent alerts
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