Plasma processing apparatus

Abstract

The invention provides an inductively coupled plasma apparatus capable of disposing a parallel coil with a large number of total turns in a relatively small space. The present plasma processing apparatus comprises a processing chamber for subjecting an object to plasma processing, an inlet means for introducing a processing gas into the processing chamber, an evacuation means for evacuating an interior of the processing chamber, a sample stage for placing the object, a power supply means for generating plasma, and at least one induction coil connected to the power supply means, wherein the induction coil is formed by connecting a plurality of identical coil elements 101 in a parallel circuit-like arrangement, the induction coil being positioned so that its center corresponds to a center of the object, and wherein input ends 101 in of the coil elements 101 are arranged at equal angular intervals calculated by dividing 360° by the number of coil elements, the coil elements having a three-dimensional structure in a radial direction and a height direction along a surface of an annular ring with an arbitrary cross-sectional shape.

1 . A plasma processing apparatus comprising: 
 a processing chamber for subjecting an object to plasma processing;    an inlet means for introducing a gas for plasma processing into the processing chamber;    an evacuation means for evacuating an interior of the processing chamber;    a sample stage for placing the object;    a power supply means for generating plasma in the processing chamber; and    at least one induction coil connected to the power supply means, wherein the induction coil is formed by connecting a plurality of identical coil elements in a parallel circuit-like arrangement, the induction coil being positioned so that its center corresponds to a center of the object, and wherein input ends of the coil elements are arranged at equal angular intervals calculated by dividing 360° by the number of coil elements, the coil elements having a three-dimensional structure in a radial direction and a height direction along a surface of an annular ring with an arbitrary cross-sectional shape.    
   
   
       2 . The plasma processing apparatus according to  claim 1 , wherein 
 the annular ring is an insulating member, and conductor portions of the coil elements are formed on the surface of the insulating member.    
   
   
       3 . The plasma processing apparatus according to  claim 2 , wherein 
 a refrigerant passage is formed to the insulating member for cooling.    
   
   
       4 . The plasma processing apparatus according to  claim 2 , wherein 
 the cross-sectional shape of the insulating member is polygonal, and the conductor portions of the coil elements are formed on the surface of the polygonal surface of the insulating member.    
   
   
       5 . The plasma processing apparatus according to  claim 2 , wherein 
 the cross-sectional shape of the insulating member is circular, and the conductor portions of the coil elements are formed on the surface of the insulating member in a toroidal coil-like shape.    
   
   
       6 . The plasma processing apparatus according to  claim 1 , wherein 
 the annular ring is a virtual annular ring, and conductor portions of the coil elements are formed along a surface of the virtual annular ring.    
   
   
       7 . A plasma processing apparatus comprising: 
 a processing chamber for subjecting an object to plasma processing;    an inlet means for introducing a gas for plasma processing into the processing chamber;    an evacuation means for evacuating an interior of the processing chamber;    a sample stage for placing the object;    a power supply means for generating plasma in the processing chamber; and    at least one induction coil connected to the power supply means, wherein the induction coil is formed by connecting a plurality of identical coil elements in a parallel circuit-like arrangement, the coil elements disposed on a surface of an annular ring having an arbitrary cross-sectional shape, and formed to rotate along a surface of the annular ring.    
   
   
       8 . The plasma processing apparatus according to  claim 7 , wherein 
 the annular ring is an insulating member, and conductor portions of the coil elements are formed on the surface of the insulating member.    
   
   
       9 . The plasma processing apparatus according to  claim 8 , wherein 
 a refrigerant passage is formed to the insulating member for cooling.    
   
   
       10 . The plasma processing apparatus according to  claim 8 , wherein 
 the cross-sectional shape of the insulating member is polygonal, and the conductor portions of the coil elements are formed on a polygonal surface of the insulating member.    
   
   
       11 . The plasma processing apparatus according to  claim 8 , wherein 
 the cross-sectional shape of the insulating member is circular, and the conductor portions of the coil elements are formed on the surface of the insulating member in a toroidal coil-like shape.    
   
   
       12 . The plasma processing apparatus according to  claim 7 , wherein 
 the annular ring is a virtual annular ring, and conductor portions of the coil elements are formed along a surface of the virtual annular ring.    
   
   
       13 . The plasma processing apparatus according to  claim 7 , wherein 
 the coil elements are rotated for a predetermined angle at a time in a circumferential direction of the annular ring, by which the coil elements are rotated at a time from one face of the annular ring to a face adjacent thereto.    
   
   
       14 . The plasma processing apparatus according to any one of claims  7  through  12 , wherein 
 the coil elements are rotated continuously.    
   
   
       15 . The plasma processing apparatus according to any one of claims  7  through  14 , wherein 
 the induction coil is formed so that input ends or output ends of the plural coil elements are disposed at predetermined even angular intervals in the circumferential direction of the annular ring.    
   
   
       16 . The plasma processing apparatus according to any one of claims  7  through  15 , wherein 
 the annular ring is arranged so that a center thereof corresponds to the center of the object.    
   
   
       17 . The plasma processing apparatus according to  claim 1  or  claim 7 , wherein 
 plural induction coils are arranged concentrically.