Substrate processing apparatus

Abstract

A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit.

1 - 16 . (canceled)  
   
   
       17 . A method of processing a substrate, comprising: 
 rotating a substrate;    processing a peripheral portion of said substrate while said substrate is being rotated;    supplying a gas around said substrate; and    drying said substrate while said gas is being supplied around said substrate.    
   
   
       18 . The method of processing a substrate according to  claim 17 , wherein processing a peripheral portion of said substrate comprises etching or cleaning said peripheral portion of the said substrate.