Dynamic mask module

Abstract

A dynamic mask module is disclosed, which comprises a microcomputer system, a mask pattern generator and a light source. The mask pattern generator is disposed over a substrate and electrically connected to the microcomputer system. The microcomputer system transmits an image signal to the mask pattern generator. The light source is disposed over the mask pattern generator to a photo-resist layer on the substrate. The mask pattern generated by the dynamic mask module is a dynamic image and the mask pattern can be changed on anytime. In addition, the manufacturing cost can be and the manufacturing time can be reduced.

1 . A layer process, comprising: 
 (a) providing a substrate;    (b) forming a photo-resist layer on the substrate;    (c) transmitting an image signal of a mask pattern from a microcomputer system to a mask pattern generator, the mask pattern generator outputting the mask pattern;    (d) performing an exposure step for transferring the mask pattern to the photo-resist layer; and    (e) performing a development step for removing a portion of the photo-resist layer and forming a patterned photo-resist layer as same as the mask pattern.    
   
   
       2 . The layer process of  claim 1 , after step (e) further comprising: 
 (f) forming a supporting layer on the patterned photo-resist layer for planarizating the patterned photo-resist layer;    (g) forming another photo-resist layer on the supporting layer;    (h) transmitting an image signal of another mask pattern from the microcomputer system to the mask pattern generator, the mask pattern generator outputting the another mask pattern;    (i) performing another exposure step for transferring the another mask pattern to the another photo-resist layer;    (j) performing another development step for removing a portion of the another photo-resist layer and forming another patterned photo-resist layer as same as the another mask pattern; and    (k) removing the supporting layer.    
   
   
       3 . The layer process of  claim 2 , before step (k) further comprising at least repeating steps (f)-(j) once.  
   
   
       4 . The layer process of  claim 1 , wherein a light source serving the exposure step is a point light source or a surface light source; when the light source is a point light source, the method further comprises modifying a gray level of the mask pattern outputted from the mask pattern generator for generating a gray level of a central area of the mask pattern less than that of a field area thereof.  
   
   
       5 . The layer process of  claim 1 , wherein a light source serving the exposure step is a point light source or a surface light source; when the light source is a point light source, the method further comprises temporarily turning off a transparent area within a central area of the mask pattern generator for unifying exposure energy.