CMP formulations

Abstract

CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed materials containing phosphonate and ammonium or amine groups respectively and optionally an organic carboxylic acid.

1 - 29 . (canceled)  
     
     
         30 . A CMP formulation which comprises a dispersion of abrasive particles with particle sizes from 15 to 80 nanometers and selected from the group consisting of silica, alumina, titania, ceria, zirconia and mixtures thereof dispersed in a formulation comprising: 
 a. an oxidant;    b. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;    c. an accelerant comprising phosphonate groups; and    d. water.    
     
     
         31 . A formulation according to  claim 30  in which the formulation further comprises an organic carboxylic acid.  
     
     
         32 . A formulation according to  claim 31  in which the organic carboxylic acid is selected from the group consisting of citric acid, oxalic acid, lactic acid, tartaric acid, glycine and mixtures of such acids.  
     
     
         33 . A formulation according to  claim 32  in which the organic carboxylic acid is present in an amount that is from 2 to 10 wt % of the formulation.  
     
     
         34 . A formulation according to  claim 30  in which the abrasive particles are silica particles with a volume average particle size of 15 to 60 nanometers.  
     
     
         35 . A formulation according to  claim 30  in which the amount of abrasive in the formulation is from 2 to 10 wt % of the weight of the formulation.  
     
     
         36 . A formulation according to  claim 30  in which the oxidizing agent is selected from the group consisting of peroxides, periodates, percarbamates and mixtures thereof.  
     
     
         37 . A formulation according to  claim 36  in which the oxidizing agent is hydrogen peroxide in a concentration of from 0.1 to 6 wt % of the formulation weight.  
     
     
         38 . A formulation according to  claim 30  in which the moderator is selected from the group consisting of compounds having the group —PO x , where x is from 1 to 4, and mixtures thereof.  
     
     
         39 . A formulation according to  claim 38  in which the moderator is present in the formulation in an amount that represents from 0.1 to 6 wt % of the formulation weight.  
     
     
         40 . A formulation according to  claim 30  in which the accelerant is selected from the group consisting of 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP), aminotri (methylenephosphonic acid) (ATMP), N-(2-hydroxyethyl])-N,N-di (methylenephosphonic acid) (HEMPA), 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTC) and mixtures thereof.  
     
     
         41 . A formulation according to  claim 40  in which the accelerant is present in the formulation in an amount that is from 0.1 to 6 wt % of the formulation weight.  
     
     
         42 . A process for the chemical-mechanical planarization of the surface of a nickel/phosphorus alloy containing from 9 to 12% of phosphorus which comprises polishing the surface in the presence of a slurry comprising a dispersion of abrasive particles with particle sizes from 15 to 80 nanometers and selected from the group consisting of silica, alumina, titania, ceria, zirconia and mixtures thereof dispersed in a formulation comprising: 
 a. an oxidant;    b. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;    c. an accelerant comprising phosphonate groups; and    d. water.    
     
     
         43 . A process according to  claim 42  in which an organic carboxylic acid is added to the formulation.  
     
     
         44 . A process according to  claim 43  in which the organic carboxylic acid is selected from the group consisting of citric acid, oxalic acid, lactic acid, tartaric acid, glycine and mixtures of such acids.  
     
     
         45 . A process according to  claim 42  in which the oxidizing agent is selected from the group consisting of peroxides, periodates, percarbamates and mixtures thereof.  
     
     
         46 . A process according to  claim 45  in which the oxidizing agent is hydrogen peroxide in a concentration of from 0.1 to 6 wt % of the formulation weight.  
     
     
         47 . A process according to  claim 42  in which the moderator is selected from the group consisting of compounds having the group —PO x , where x is from 1 to 4, and mixtures thereof.  
     
     
         48 . A process according to  claim 42  in which the accelerant is selected from the group consisting of 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP), aminotri (methylenephosphonic acid) (ATMP), N-(2-hydroxyethyl])-N,N-di (methylenephosphonic acid) (HEMPA), 2-phosphonobutane-1,2,4-tricarboxylic acid (PBTC) and mixtures thereof.  
     
     
         49 . A CMP formulation which comprises a dispersion of abrasive particles comprising silica with particle sizes from 15 to 80 nanometers dispersed in a formulation comprising: 
 a. an oxidant;    b. a moderator of the action of the oxidizing agent which comprises a phosphate or phosphite group;    c. an accelerant comprising phosphonate groups; and    d. water.