US2005284259A1PendingUtilityA1

Tantalum sputtering target and method of manufacture

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Assignee: ROSENBERG HARRYPriority: May 27, 1998Filed: Aug 3, 2005Published: Dec 29, 2005
Est. expiryMay 27, 2018(expired)· nominal 20-yr term from priority
B22F 2999/00C23C 14/3414H01G 9/042C22B 34/24C01G 35/006Y10S438/923Y10S438/968C22B 5/00C22C 27/02B22F 1/00B22F 9/30
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Claims

Abstract

Described is a method for producing high purity tantalum, the high purity tantalum so produced and sputtering targets of high purity tantalum. The method involves purifying starting materials followed by subsequent refining into high purity tantalum.

Claims

exact text as granted — not AI-modified
1 - 30 . (canceled)  
   
   
       31 . A high purity tantalum powder comprising greater than or equal to 99.95 weight percent (wt %) tantalum on a total metals basis, less than 500 parts per million by weight (ppmw) total metallic impurities, less than 50 ppmw tungsten or molybdenum, and less than 10 ppmw niobium.  
   
   
       32 . The powder of  claim 31  comprising less than 20 ppmw tungsten or molybdenum.  
   
   
       33 . The powder of  claim 31  comprising less than 5 ppmw each of tungsten and molybdenum.  
   
   
       34 . The powder of  claim 31  comprising less than 5 ppmw total of tungsten and molybdenum.  
   
   
       35 . The powder of  claim 31  comprising less than 20 ppmw total of tungsten, molybdenum, and niobium.  
   
   
       36 . The powder of  claim 31  comprising less than 5 ppmw total of tungsten, molybdenum, and niobium.  
   
   
       37 . The powder of  claim 31  comprising less than 3 ppmw niobium.  
   
   
       38 . The powder of  claim 31  comprising less than 100 ppmw oxygen.  
   
   
       39 . The powder of  claim 31  comprising less than 25 ppmw oxygen.  
   
   
       40 . The powder of  claim 31  comprising less than 10 parts per billion by weight (ppbw) uranium and thorium.  
   
   
       41 . An ingot formed from the powder of  claim 31 .  
   
   
       42 . A sputtering target blank formed from the powder of  claim 31 .  
   
   
       43 . A sputtering target blank comprising greater than or equal to 99.95 weight percent (wt %) tantalum on a total metals basis, less than 500 parts per million by weight (ppmw) total metallic impurities, and less than 5 ppmw total of tungsten, molybdenum, and niobium.  
   
   
       44 . The blank of  claim 43  comprising less than 25 ppmw oxygen.  
   
   
       45 . The blank of  claim 43  comprising less than 10 parts per billion by weight (ppbw) uranium and thorium.

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