US2006016558A1PendingUtilityA1

Endpoint detecting device in semiconductor manufacturing system

Assignee: PARK BONG-JINPriority: Jul 20, 2004Filed: Jun 14, 2005Published: Jan 26, 2006
Est. expiryJul 20, 2024(expired)· nominal 20-yr term from priority
Inventors:Bong-Jin Park
H10P 74/238H10P 50/242H01J 37/32963G01N 21/73H01J 37/32935
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Claims

Abstract

An endpoint detecting device used during a semiconductor manufacturing process to manufacture semiconductor devices. The endpoint detecting device is constructed such that a filter has a polyhedral shape or a semi-spherical shape.

Claims

exact text as granted — not AI-modified
1 . An endpoint detecting device to detect an endpoint during an etching process, comprising: 
 a filter having at least two incidence surfaces adapted to receive plasma wavelengths;    a sensor to detect the received plasma wavelengths and generate a corresponding signal;    an analog/digital (A/D) converter to convert the corresponding signal to a digital signal; and    a controller responsive to the digital signal and adapted to determine the endpoint.    
   
   
       2 . The device according to  claim 1 , wherein the filter has a shape of a triangular prism.  
   
   
       3 . The device according to  claim 1 , wherein the filter has a shape of a triangular pyramid.  
   
   
       4 . The device according to  claim 1 , wherein the filter has a shape of a quadrangular pyramid.  
   
   
       5 . The device according to  claim 1 , wherein the filter has a shape of a pentagonal pyramid.  
   
   
       6 . The device of  claim 1 , further comprising: 
 an amplifier to amplify the corresponding signal; and    an input/output (I/O) unit adapted to output a signal to the controller.    
   
   
       7 . An endpoint detecting device to detect an endpoint during an etching process, comprising: 
 a filter having a curved incidence surface adapted to receive plasma wavelengths;    a sensor to receive the plasma wavelengths and generate corresponding signal;    an analog/digital (A/D) converter to convert the corresponding signal to a digital signal; and    a controller responsive to the digital signal and adapted to determine the etching endpoint.    
   
   
       8 . The device according to  claim 7 , wherein a shape of the filter is semi-spherical.  
   
   
       9 . The device according to  claim 7 , wherein a shape of the filter is spherical.  
   
   
       10 . The device according to  claim 7 , wherein a shape of the filter is sinewave.  
   
   
       11 . The device according to  claim 7 , wherein a shape of the filter is concave or convex.  
   
   
       12 . The device of  claim 7 , further comprising: 
 an amplifier to amplify the corresponding signal; and    an input/output (I/O) unit adapted to output a signal to the controller.

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