Flat panel display device and fabrication method thereof
Abstract
A top-emitting organic light-emitting device can prevent a voltage drop by electrically coupling a cathode bus line to a cathode electrode. A method for fabricating the same is also disclosed. The flat panel display device comprises an insulating substrate having a pixel region and a non-pixel region, a first electrode arranged in the pixel region. a second electrode arranged in the pixel region and the non-pixel region, an organic emission layer and a charge transporting layer formed between the first electrode and the second electrode of the pixel region, and an electrode line formed in the pixel region and the non-pixel region. The electrode line and the second electrode are electrically and directly coupled to each other in the non-pixel region.
Claims
exact text as granted — not AI-modified1 - 24 . (canceled)
25 . A flat panel display, comprising:
a substrate having an emission region and a non-emission region; a plurality of thin film transistors arranged on the substrate; a passivation layer arranged on the thin film transistors; a first conductive line arranged at the emission region; a second conductive line on the substrate; an organic emission layer and a charge transporting layer arranged between the first conductive line and the second conductive line; and a plurality of third conductive lines arranged on a portion of the non-emission region, wherein the third conductive line and the second conductive line are electrically coupled with each other at the non-emission region.
26 . The flat panel display device of claim 25 , wherein the third conductive line arranged in the portion of the non-emission region is a conductive material that absorbs an external light.
27 . The flat panel display device of claim 26 , wherein the charge transporting layer is arranged between the third conductive line and the second conductive line.
28 . The flat panel display device of claim 25 , wherein the third conducive line is a stripe like shape or a matrix like shape having an open portion that corresponds to the emission region.
29 . The flat panel display device of claim 25 , wherein the charge transporting layer is arranged on the non-emission region and on the emission region.
30 . The flat panel display device of claim 25 , wherein the third conductive line has a current with a voltage having a same polarity as the second conductive line.
31 . The flat panel display device of claim 25 , wherein the third conductive line is a supplementary conductive line of the second conductive line.
32 . The flat panel display device of claim 25 , wherein the third conductive line is directly coupled to the second conductive line.
33 . The flat panel display device of claim 25 , wherein the third conductive line is arranged along a peripheral area of the non-emission region on the substrate so that the third conductive line is electrically coupled with the second conductive line.
34 . The flat panel display device of claim 33 , wherein the third conductive line is directly coupled to the second conductive line.
35 . The flat panel display device of claim 25 , wherein the third conductive line is arranged in at least one outer side of the non-emission region so that the third conductive line is electrically coupled with the second conductive line.
36 . The flat panel display device of claim 35 , wherein the third conductive line is directly coupled to the second conductive line.
37 . The flat panel display device of claim 25 , wherein the organic emission layer is only arranged on the first conductive line, and wherein the charge transporting layer is arranged on the non-emission region and on the emission region.
38 . The flat panel display device of claim 25 , wherein a pixel defining layer is formed under at least one of the third conductive layers.
39 . The flat panel display device of claim 25 , wherein the third conductive line is directly coupled to the second conductive line.
40 . A method for fabricating a flat panel display, comprising:
providing a substrate having an emission region and a non-emission region; forming a plurality of thin film transistors on the substrate; forming a passivation layer over the substrate on the thin film transistors; forming a first conductive line on the emission region; forming an organic emission layer and a charge transporting layer on the first conductive line; forming a plurality of third conductive lines on the non-emission region; and forming a second conductive line in the emission region and in the non-emission region, wherein the third conductive line and the second conductive line are electrically coupled in the non-emission region.
41 . The method of claim 40 , further comprising:
using a fine metal mask to partially form the organic emission layer on only the first conductive; and using an open mask to form the charge transporting layer on the non-emission region.
42 . The method of claim 40 , wherein the third conductive line is formed in a portion of the non-emission region.
43 . The method of claim 40 , wherein the third conductive line arranged in the portion of the non-emission region is a conductive material that absorbs an external light.
44 . The method of claim 43 , wherein the charge transporting layer is formed between a portion of the third conductive line, which is formed in the portion of the non-emission region, and the second electrode.
45 . The method of claim 40 , wherein the third conductive line is directly coupled to the second conductive line.
46 . The method of claim 40 , wherein the third conductive line is arranged in at least one outer side of the non-pixel region on the substrate to be electrically coupled with the second conductive line.
47 . The method of claim 46 , wherein the third conductive line is directly coupled to the second conductive line.
48 . The method of claim 40 , wherein the third conducive line is a stripe like shape or a matrix like shape having an open portion in the third conductive line that corresponds to the emission region.
49 . The method of claim 40 , wherein the charge transporting layer is arranged on the non-emission region and on the emission region.
50 . The method of claim 40 , wherein the third conductive line has a current with a voltage having a same polarity as the second conductive line.
51 . The method of claim 40 , wherein the third conductive line is a supplementary conductive line of the second conductive line.
52 . The method of claim 40 , wherein the third conductive line is arranged along an outer periphery of the non-emission region so that the third conductive line is electrically coupled with the second conductive line in the non-emission region.
53 . The method of claim 52 , wherein the third conductive line is directly coupled to the second conductive line.
54 . The method of claim 40 , wherein the third conductive line is arranged in at least one outer side of the non-emission region so that the third conductive line is electrically coupled with the second conductive line.
55 . The method of claim 54 , wherein the third conductive line is directly coupled to the second conductive line.
56 . The method of claim 40 , further comprising forming a pixel defining layer before forming the third conductive lines on the non-emission region.Cited by (0)
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