Method for deposition onto a substrate and method for producing photo conductor

Abstract

A grounded vacuum container is filled, the container containing a plurality of substrates, with a CVD gas. A voltage is applied to the substrates to generate plasma around each of the substrates along with grounding a plurality of ground members arranged at positions opposite to the deposition surface of each of the substrates inside the vacuum container. A coating is deposited onto a plurality of substrates in a method for deposition that attracts ions within the plasma to the substrates and deposits a coating onto the substrates.

1 . A method for depositing a layer on a substrate using a grounded vacuum container, the vacuum container containing a plurality of substrates, a photo conductor being formed on each of the plurality of substrates, the method comprising: 
 arranging a plurality of ground members around each of the plurality of substrates in the vacuum container;    filling the vacuum container with a CVD (Chemical Vapor Deposition) gas;    applying a voltage to the plurality of substrates to generate plasma around the plurality of substrates, ions being generated by collisions between the CVD gas and the generated plasma; and    attracting the generated ions to the plurality of substrates to deposit a layer on each of the plurality of substrates.    
     
     
         2 . The method according to  claim 1 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage.  
     
     
         3 . The method according to  claim 1 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage combined with a negative voltage.  
     
     
         4 . The method according to  claim 3 , wherein the high-frequency voltage and the negative voltage comprise pulse voltages.  
     
     
         5 . The method according to  claim 1 , wherein the ground member comprises a cylindrical member, and each of the plurality of the cylindrical members is arranged around each of the plurality of substrates.  
     
     
         6 . The method according to  claim 1 , wherein the ground member comprises a hollow cylindrical member, and each of the plurality of substrates is contained in each of the plurality of the hollow cylindrical members.  
     
     
         7 . The method according to  claim 6 , wherein a surface of the ground member comprises a mesh.  
     
     
         8 . The method according to  claim 1 , a distance between the periphery of the vacuum container and a substrate closest to the periphery of the vacuum container is D 1 , and a distance between a substrate and a closest ground member is D 2 , D 1  being larger than D 2 .  
     
     
         9 . The method according to  claim 1 , a length of the ground member is L 1 , and a length of the substrate is L 2 , L 1  being larger than L 2 .  
     
     
         10 . A method for producing a photo conductor using a grounded vacuum container, the vacuum container containing a plurality of substrates, a photo conductor being formed on each of the plurality of substrates, the method comprising: 
 arranging a plurality of ground members around each of the plurality of substrates in the vacuum container;    filling the vacuum container with a CVD (Chemical Vapor Deposition) gas;    applying a voltage to the plurality of substrates to generate plasma around the plurality of substrates, ions being generated by collisions between the CVD gas and the generated plasma; and    attracting the generated ions to the plurality of substrates to deposit a layer on each of the plurality of substrates.    
     
     
         11 . The method according to  claim 10 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage.  
     
     
         12 . The method according to  claim 10 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage combined with a negative voltage.  
     
     
         13 . The method according to  claim 12 , wherein the high-frequency voltage and the negative voltage comprise pulse voltages.  
     
     
         14 . The method according to  claim 10 , wherein the ground member comprises a cylindrical member, and each of the plurality of the cylindrical members are arranged around each of the plurality of substrates.  
     
     
         15 . The method according to  claim 10 , wherein the ground member comprises a hollow cylindrical member, and each of the plurality of substrates is contained in each of the plurality of the hollow cylindrical members.  
     
     
         16 . The method according to  claim 15 , wherein a surface of the ground member comprises a mesh.  
     
     
         17 . The method according to  claim 10 , a distance between the periphery of the vacuum container and a substrate closest to the periphery of the vacuum container is D 1 , and a distance between a substrate and a closest ground member is D 2 , D 1  being larger than D 2 .  
     
     
         18 . The method according to  claim 10 , a length of the ground member is L 1 , and a length of the substrate is L 2 , L 1  being larger than L 2 .  
     
     
         19 . The method according to  claim 10 , wherein the layer deposited on the substrate comprises a layer of hydrocarbon gas-based amorphous carbon.  
     
     
         20 . A method for depositing a layer on a substrate using a grounded vacuum container, the vacuum container containing a plurality of substrates, a photo conductor being formed on each of the plurality of substrates, the method comprising: 
 arranging a plurality of ground members around each of the plurality of substrates in the vacuum container;    filling the vacuum container with a CVD (Chemical Vapor Deposition) gas;    controlling gas pressure of the CVD gas, based on a distance between the substrate and the ground member;    applying a voltage to the plurality of substrates to generate plasma around the plurality of substrates, ions being generated by collisions between the CVD gas and the generated plasma; and    attracting the generated ions to the plurality of substrates to deposit a layer on each of the plurality of substrates.    
     
     
         21 . The method according to  claim 20 , wherein the shorter the distance between the substrate and the ground member, the higher the gas pressure.  
     
     
         22 . A method for depositing a layer on a substrate using a grounded vacuum container, the vacuum container containing a plurality of substrates, a photo conductor being formed on each of the plurality of substrates, the method comprising: 
 arranging a plurality of ground members around each of the plurality of substrates in the vacuum container;    filling the vacuum container with a CVD (Chemical Vapor Deposition) gas;    controlling a voltage applied to the plurality of substrates, based on a distance between the substrate and the ground member;    applying a voltage to the plurality of substrates to generate plasma around the plurality of substrates, ions being generated by collisions between the CVD gas and the generated plasma; and    attracting the generated ions to the plurality of substrates to deposit a layer on each of the plurality of substrates.    
     
     
         23 . The method according to  claim 22 , wherein the shorter the distance between the substrate and the ground member, the lower the voltage.  
     
     
         24 . The method according to  claim 22 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage.  
     
     
         25 . The method according to  claim 22 , wherein the voltage applied to the plurality of substrates comprises a high-frequency voltage combined with a negative voltage.  
     
     
         26 . The method according to  claim 25 , wherein the high-frequency voltage and the negative voltage comprise pulse voltages.  
     
     
         27 . The method according to  claim 22 , wherein the substrate comprises a metallic tub in a cylindrical shape.  
     
     
         28 . The method according to  claim 27 , wherein the metallic tub comprises a core tube utilized for a photo conductor.  
     
     
         29 . The method according to  claim 22 , wherein the ground member comprises a cylindrical member, and each of the plurality of the cylindrical members are arranged around each of the plurality of substrates.  
     
     
         30 . The method according to  claim 22 , wherein the ground member comprises a hollow cylindrical member, and each of the plurality of substrates is contained in each of the plurality of the hollow cylindrical members.  
     
     
         31 . The method according to  claim 22 , wherein the layer deposited on the substrate comprises a layer of hydrocarbon gas-based amorphous carbon.  
     
     
         32 . The method according to  claim 31 , wherein the layer of hydrocarbon gas-based amorphous carbon comprises a protective surface layer of a photo conductor.