Substrate processing apparatus

Abstract

A substrate processing apparatus comprises a substrate transfer section, a plurality of modules and a first substrate transfer robot provided in the substrate transfer section and capable of transferring substrates to the plurality of modules. The plurality of modules are piled up, separately from one another, in a vertical direction. Each of the plurality of modules are detachably mounted to the substrate transfer section and includes a substrate processing chamber, an intermediate chamber, a first gate valve disposed between the substrate processing chamber and the intermediate chamber, a second gate valve disposed between the intermediate chamber and the substrate transfer section, and a second substrate transfer robot disposed in the intermediate chamber. Preferably, the substrate processing chamber further comprises a second intermediate chamber having a substrate holder therein and disposed between the intermediate chamber and the substrate transfer section, and a third gate valve disposed between the second intermediate chamber and the substrate transfer section.

1 . A substrate processing apparatus, comprising: 
 a substrate transfer section;    a plurality of modules, each of said plurality of modules being directly detachably attached to said substrate transfer section; and    a common first substrate transfer device, provided in said substrate transfer section, for transferring substrates into said plurality of modules,    wherein said plurality of modules are piled up adjacent to, but spaced separately from one another in a substantially vertical direction such that said plurality of modules are capable of being attached to and detached from a wall of said substrate transfer section independent of one another, 
 wherein each of said plurality of modules comprises:  
 a substrate processing chamber, having a hermetic structure, for processing said substrates;  
 an intermediate chamber having a hermetic structure and provided between said substrate processing chamber and said substrate transfer section;  
 a first valve provided between said substrate processing chamber and said intermediate chamber, said first valve capable of establishing hermetic isolation between said substrate processing chamber and said intermediate chamber when closed, and capable of allowing said substrates to pass therethrough when opened; and  
 a second valve provided between said intermediate chamber and said substrate transfer section, said second valve capable of establishing hermetic isolation between said intermediate chamber and said substrate transfer section when closed, and capable of allowing said substrates to pass therethrough when opened, and  
   wherein said intermediate chamber is provided with a second substrate transfer device for transferring said substrates to and from said substrate processing chamber.