US2006096707A1PendingUtilityA1

Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge

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Assignee: SELWYN GARY SPriority: Feb 2, 2001Filed: Dec 14, 2005Published: May 11, 2006
Est. expiryFeb 2, 2021(expired)· nominal 20-yr term from priority
H10P 14/60H10P 72/0421H01J 37/32082H01J 37/32733B08B 7/0035C23G 5/00
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Claims

Abstract

Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

Claims

exact text as granted — not AI-modified
1 - 25 . (canceled)  
   
   
       26 . Apparatus for processing materials in an atmospheric pressure radio-frequency non-thermal plasma consisting of: 
 an electrically conductive enclosure defining and interior space with a surface and openings for introductions of a gas and for entry and exit of a material to be processed while said interior space is at or near atmospheric pressure;    an electrode situated inside said interior space and spaced apart from said surface of said interior space a distance sufficient to allow placement of said material to be processed;    a mechanical action for placing said material to be processed inside said interior space on said electrode or between said electrode and said electrically conductive enclosure; and,    a radio frequency power supply having a phase applied between said electrode and said electrically conductive enclosure;    wherein a gas containing a majority of inert gas is introduced into said interior space through said opening for introduction of a gas creating an atmospheric pressure plasma in said interior space for processing said material to be processed within said electrically conductive enclosure.    
   
   
       27 . The apparatus as described in  claim 26 , wherein said phase has a frequency of 13.56 Megahertz.  
   
   
       28 . The apparatus as described in  claim 26 , wherein said electrode and said electrically conductive enclosure are cylindrically shaped.  
   
   
       29 . The apparatus as described in  claim 26 , wherein said electrode is a rotating roller.

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