Producing method of stamper for light guide plate

Abstract

Disclosed is a producing method of a stamper for a light guide plate, wherein the method includes the steps of: cleansing a conductor layer deposited layer; plating the conductor layer with a conductive material; spin coating a photoresist on the plating layer; placing a desired pattern mask, exposing and developing; wet etching the plating layer in a portion where the photoresist is partially removed; removing the remaining photoresist; fabricating a master by nickel plating a completed pattern surface; and releasing the master and nickel plating the master again to produce a stamper.

1 . A producing method of a stamper for a light guide plate, the method comprising the steps of: 
 cleansing a conductor layer deposited layer;    plating the conductor layer with a conductive material;    spin coating a photoresist on the plating layer;    placing a desired pattern mask, exposing and developing;    wet etching the plating layer in a portion where the photoresist is partially removed;    removing the remaining photoresist;    fabricating a master by nickel plating a completed pattern surface; and    releasing the master and nickel plating the released master again to produce a stamper.    
   
   
       2 . The method according to  claim 1 , wherein the conductive material is selected from copper, nickel and chrome.  
   
   
       3 . The method according to  claim 1 , wherein the etching depth is same with the thickness of the plating layer.  
   
   
       4 . The method according to  claim 1 , wherein an etching solution for use in the etching process is a mixture of nitric acid and ultra pure water, or a mixture of sulfuric acid, peroxide and ultra pure water.