Selectively growing a polymeric material on a semiconductor substrate

Abstract

A surface may be selectively coated with a polymer using an induced surface grafting or polymerization reaction. The reaction proceeds in those regions that are polymerizable and not in other regions. Thus, a semiconductor structure having organic regions and metal regions exposed, for example, may have the organic polymers formed selectively on the organic regions and not on the unpolymerizable or metal regions.

1 . A semiconductor structure comprising: 
 a surface including an exposed polymerizable region and an exposed unpolymerizable region; and    a polymer selectively attached to said polymerizable region to form a surface coating that selectively covers said polymerizable region.    
   
   
       2 . The structure of  claim 1  wherein said unpolymerizable region is metal.  
   
   
       3 . The structure of  claim 1  wherein said polymerizable region is a dielectric.  
   
   
       4 . The structure of  claim 1  wherein said polymer is derived from benzophenone.  
   
   
       5 . A semiconductor structure comprising: 
 a surface including an exposed region with extractable hydrogen and an exposed region without extractable hydrogen; and    a polymer selectively attached to said exposed region with extractable hydrogen to form a surface coating that selectively covers said exposed region with extractable hydrogen.    
   
   
       6 . The structure of  claim 5  wherein said surface includes a metal region that is without extractable hydrogen.  
   
   
       7 . The structure of  claim 1  wherein said region with extractable hydrogen is a dielectric.  
   
   
       8 . The structure of  claim 5  wherein said polymer is derived from benzophenone.