Multilayer composites and manufacture of same

Abstract

The present invention is directed towards a process of depositing multilayer thin films, disk-shaped targets for deposition of multilayer thin films by a pulsed laser or pulsed electron beam deposition process, where the disk-shaped targets include at least two segments with differing compositions, and a multilayer thin film structure having alternating layers of a first composition and a second composition, a pair of the alternating layers defining a bi-layer wherein the thin film structure includes at least 20 bi-layers per micron of thin film such that an individual bi-layer has a thickness of less than about 100 nanometers.

1 - 33 . (canceled)  
   
   
       34 . A multilayer thin film structure having alternating layers of a first composition and a second composition, a pair of said alternating layers defining a bi-layer wherein said thin film structure includes at least 20 bi-layers per micron of thin film such that an individual bi-layer has a thickness of less than about 50 nanometers.  
   
   
       35 . The multilayer thin film structure of  claim 34  wherein said bi-layers include a layer of YBCO and a layer of EuBCO.